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Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]
Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum ).
Cathodic arc deposition: a high-power electric arc discharged at the target (source) material blasts away some into highly ionized vapor to be deposited onto the workpiece. Electron-beam physical vapor deposition : the material to be deposited is heated to a high vapor pressure by electron bombardment in "high" vacuum and is transported by ...
Download as PDF; Printable version; ... Pages in category "Thin film deposition" ... Cathodic arc deposition; Chemical bath deposition;
Category for techniques in physical vapor deposition Pages in category "Physical vapor deposition techniques" The following 10 pages are in this category, out of 10 total.
The thermionic vacuum arc (TVA) is a new type of plasma source, which generates a plasma containing ions with a directed energy. TVA discharges can be ignited in high-vacuum conditions between a heated cathode (electron gun) and an anode (tungsten crucible) containing the material.
The coatings are mostly deposited by cathodic arc deposition or magnetron sputtering. Even though most TiAlN and AlTiN coatings are industrially synthesized using alloy targets with specific percentages of aluminium and titanium it is possible to produce TiAlN coatings with pure Al and Ti targets using a cathodic arc deposition technique.