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  2. Harbor Freight Tools - Wikipedia

    en.wikipedia.org/wiki/Harbor_Freight_Tools

    Harbor Freight Tools, commonly referred to as Harbor Freight, is an American privately held tool and equipment retailer, headquartered in Calabasas, California. It operates a chain of retail stores, as well as an e-commerce business. The company employs over 28,000 people in the United States, [5] and has over 1,500 locations in 48 states. [6] [7]

  3. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...

  4. Harbor Freight Tools new 16,000-square-foot store to open in ...

    www.aol.com/news/harbor-freight-tools-16-000...

    Harbor Freight Tools is opening a new 16,000-square-foot store in Fort Worth later this winter and will be hiring for 25 to 30 positions, the discount tool company said in a press release.. The ...

  5. Etching - Wikipedia

    en.wikipedia.org/wiki/Etching

    However, from 1880 to 1950 a photo-mechanical ("line-block") variant was the dominant form of commercial printing for images. A similar process to etching, but printed as a relief print, so it is the "white" background areas which are exposed to the acid, and the areas to print "black" which are covered with ground. Blake's exact technique ...

  6. Buffered oxide etch - Wikipedia

    en.wikipedia.org/wiki/Buffered_oxide_etch

    Buffered oxide etch is commonly used for more controllable etching. [1] Buffering HF with NH 4 F results in a solution with a more stable pH; thus, more stable concentrations of HF and HF − 2, and a more stable etch rate. [2] Some oxides produce insoluble products in HF solutions.

  7. Deep reactive-ion etching - Wikipedia

    en.wikipedia.org/wiki/Deep_reactive-ion_etching

    To etch through a 0.5 mm silicon wafer, for example, 100–1000 etch/deposit steps are needed. The two-phase process causes the sidewalls to undulate with an amplitude of about 100–500 nm. The cycle time can be adjusted: short cycles yield smoother walls, and long cycles yield a higher etch rate.

  8. Lift-off (microtechnology) - Wikipedia

    en.wikipedia.org/wiki/Lift-off_(microtechnology)

    Lift-off is applied in cases where a direct etching of structural material would have undesirable effects on the layer below. Lift-off is a cheap alternative to etching in a research context, which permits a slower turn-around time. Finally, lifting off a material is an option if there is no access to an etching tool with the appropriate gases.

  9. Plasma etching - Wikipedia

    en.wikipedia.org/wiki/Plasma_etching

    Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged or neutral (atoms and radicals).

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