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  2. Spin coating - Wikipedia

    en.wikipedia.org/wiki/Spin_coating

    Laurell Technologies WS-400 spin coater used to apply photoresist to the surface of a silicon wafer. Spin coating is a procedure used to deposit uniform thin films onto flat substrates. Usually a small amount of coating material in liquid form is applied on the center of the substrate, which is either spinning at low speed or not spinning at all.

  3. Layer by layer - Wikipedia

    en.wikipedia.org/wiki/Layer_by_layer

    The bilayers and wash steps can be performed in many different ways including dip coating, spin-coating, spray-coating, flow based techniques and electro-magnetic techniques. [1] The preparation method distinctly impacts the properties of the resultant films, allowing various applications to be realized. [ 1 ]

  4. L. E. Scriven - Wikipedia

    en.wikipedia.org/wiki/L._E._Scriven

    His 1988 paper "Physics and Applications of Dip Coating and Spin Coating" is widely referenced in various industries. ... Applied Mechanics Reviews, 19:735-48 (1966 ...

  5. Slot-die coating - Wikipedia

    en.wikipedia.org/wiki/Slot-die_coating

    A schematic of a typical slot-die coating system. Slot-die coating equipment is available in a variety of configurations and form factors. However, the vast majority of slot-die processes are driven by a similar set of common core components. These include: A fluid reservoir to store the main supply of coating fluid for the system; A pump to ...

  6. Self-cleaning glass - Wikipedia

    en.wikipedia.org/wiki/Self-cleaning_glass

    The first self-cleaning glass was based on a thin film titania coating. [3] The film can be applied by spin coating of organo-titanate chelated precursor (for example titanium iso-tetrapropoxide chelated by acetylacetone), followed by heat treatment at elevated temperatures to burn the organic residues and to form the anatase phase.

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  8. Thin film - Wikipedia

    en.wikipedia.org/wiki/Thin_film

    Dip coating is similar to spin coating in that a liquid precursor or sol-gel precursor is deposited on a substrate, but in this case the substrate is completely submerged in the solution and then withdrawn under controlled conditions. By controlling the withdrawal speed, the evaporation conditions (principally the humidity, temperature) and the ...

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