enow.com Web Search

Search results

  1. Results from the WOW.Com Content Network
  2. 45 nm process - Wikipedia

    en.wikipedia.org/wiki/45_nm_process

    Intel's 45nm process has a transistor density of 3.33 million transistors per square milimeter (MTr/mm2). [ 5 ] AMD released its Sempron II , Athlon II , Turion II and Phenom II (in generally increasing order of performance), as well as Shanghai Opteron processors using 45 nm process technology in late 2008.

  3. List of semiconductor scale examples - Wikipedia

    en.wikipedia.org/wiki/List_of_semiconductor...

    Mitsubishi Electric, Toshiba and NEC introduced 16 Mb DRAM memory chips manufactured with a 600 nm process in 1989. [47] NEC's 16 Mb EPROM memory chip in 1990. [47] Mitsubishi's 16 Mb flash memory chip in 1991. [47] Intel 80486DX4 CPU launched in 1994. IBM/Motorola PowerPC 601, the first PowerPC chip, was produced in 0.6 μm.

  4. Flash memory - Wikipedia

    en.wikipedia.org/wiki/Flash_memory

    Flash memory is an electronic non-volatile computer memory storage medium that can be electrically erased and reprogrammed. The two main types of flash memory, NOR flash and NAND flash, are named for the NOR and NAND logic gates. Both use the same cell design, consisting of floating-gate MOSFETs. They differ at the circuit level depending on ...

  5. List of Mac models grouped by CPU type - Wikipedia

    en.wikipedia.org/wiki/List_of_Mac_models_grouped...

    The PowerPC 970 ("G5") was the first 64-bit Mac processor. The PowerPC 970MP was the first dual-core Mac processor and the first to be found in a quad-core configuration. It was also the first Mac processor with partitioning and virtualization capabilities. Apple only used three variants of the G5, and soon moved entirely onto Intel architecture.

  6. 32 nm process - Wikipedia

    en.wikipedia.org/wiki/32_nm_process

    The "32 nm" node is the step following the "45 nm" process in CMOS semiconductor device fabrication. "32-nanometre" refers to the average half-pitch (i.e., half the distance between identical features) of a memory cell at this technology level. Toshiba produced commercial 32 GiB NAND flash memory chips with the "32 nm" process in 2009. [1]

  7. Charge trap flash - Wikipedia

    en.wikipedia.org/wiki/Charge_trap_flash

    Charge trap flash (CTF) is a semiconductor memory technology used in creating non-volatile NOR and NAND flash memory. It is a type of floating-gate MOSFET memory technology , but differs from the conventional floating-gate technology in that it uses a silicon nitride film to store electrons rather than the doped polycrystalline silicon typical ...

  8. DataFlash - Wikipedia

    en.wikipedia.org/wiki/DataFlash

    DataFlash is a low pin-count serial interface for flash memory. It was developed as an Atmel proprietary interface, compatible with the SPI standard. In October 2012, the AT45 series DataFlash product lines, related intellectual property, and supporting employee teams were purchased by Adesto Technologies. [1] [2]

  9. Multiple patterning - Wikipedia

    en.wikipedia.org/wiki/Multiple_patterning

    For example, in a cross-pitch source-mask optimization for 7nm node, for 40-48 nm pitch and 32 nm pitch, the quality as determined by the normalized image log slope was insufficient (NILS<2), while only 36 nm pitch was barely satisfactory for bidirectional single exposure.