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  2. 1951 USAF resolution test chart - Wikipedia

    en.wikipedia.org/wiki/1951_USAF_resolution_test...

    A USAF 1951 resolution chart in PDF format is provided by Yoshihiko Takinami. This chart should be printed such that the side of the square of the 1st element of the group -2 should be 10 mm long. USAF 1951 Resolution Target Further explanations and examples; Koren 2003: Norman Koren's updated resolution chart better suited for computer analysis

  3. ImageJ - Wikipedia

    en.wikipedia.org/wiki/ImageJ

    ImageJ is a Java-based image processing program developed at the National Institutes of Health and the Laboratory for Optical and Computational Instrumentation (LOCI, University of Wisconsin). [ 2 ] [ 3 ] Its first version, ImageJ 1.x, is developed in the public domain , while ImageJ2 and the related projects SciJava , ImgLib2 , and SCIFIO are ...

  4. List of semiconductor scale examples - Wikipedia

    en.wikipedia.org/wiki/List_of_semiconductor...

    TSMC have announced plans to release 3 nm devices during 2021–2022. [134] [135] Samsung Electronics have begun risk production of 3 nm GAAFET transistors in June of 2022. [136] Apple A17 Pro (iPhone 15 Pro)

  5. Fiji (software) - Wikipedia

    en.wikipedia.org/wiki/FIJI_(software)

    The script editor in Fiji supports rapid prototyping of scripts and ImageJ plugins, making Fiji a powerful tool to develop new image processing algorithms and explore new image processing techniques with ImageJ. [16] [17]

  6. Digital image correlation and tracking - Wikipedia

    en.wikipedia.org/wiki/Digital_image_correlation...

    The concept of using cross-correlation to measure shifts in datasets has been known for a long time, and it has been applied to digital images since at least the early 1970s. [ 1 ] [ 2 ] The present-day applications are almost innumerable, including image analysis, image compression, velocimetry, and strain estimation.

  7. 3 μm process - Wikipedia

    en.wikipedia.org/wiki/3_μm_process

    The 3 μm process (3 micrometer process) is the level of MOSFET semiconductor process technology that was reached around 1977, [1] [2] by companies such as Intel. The 3 μm process refers to the minimum size that could be reliably produced. The smallest transistors and other circuit elements on a chip made with this process were around 3 ...

  8. X-ray microtomography - Wikipedia

    en.wikipedia.org/wiki/X-ray_microtomography

    Volume rendering is a technique used to display a 2D projection of a 3D discretely sampled data set, as produced by a microtomography scanner. Usually these are acquired in a regular pattern, e.g., one slice every millimeter, and usually have a regular number of image pixels in a regular pattern.

  9. Otsu's method - Wikipedia

    en.wikipedia.org/wiki/Otsu's_method

    One limitation of the Otsu’s method is that it cannot segment weak objects as the method searches for a single threshold to separate an image into two classes, namely, foreground and background, in one shot. Because the Otsu’s method looks to segment an image with one threshold, it tends to bias toward the class with the large variance. [14]