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  2. Harbor Freight Tools - Wikipedia

    en.wikipedia.org/wiki/Harbor_Freight_Tools

    In 1982, Harbor Freight Tools opened its first retail store in Lexington, Kentucky, to sell returned merchandise from its mail order business. The original location was at 1387 East New Circle Road. It later moved to 1301 Winchester Road, Suite 213. The venture proved successful, and Harbor Freight Tools began to open stores across the United ...

  3. Chromate conversion coating - Wikipedia

    en.wikipedia.org/wiki/Chromate_conversion_coating

    The process is rapid (1–5 min), requires a single ambient temperature process tank and associated rinse, and is relatively trouble free. [2] As of 1995, Henkel's Alodine 1200s commercial formula for aluminum consisted of 50-60% chromic anhydride CrO 3, 20-30% potassium tetrafluoroborate KBF 4, 10-15% potassium ferricyanide K

  4. Eric Smidt - Wikipedia

    en.wikipedia.org/wiki/Eric_Smidt

    Harbor Freight Tools for Schools awards $1.5 million to skilled trades teachers and their schools annually. [ 10 ] Marking the opening of the 500th Harbor Freight Tools store near Chicago , Smidt announced the contribution of $100,000 and the donation of tools to Chicago Public Schools to support teachers and students in skilled trades learning ...

  5. Buffered oxide etch - Wikipedia

    en.wikipedia.org/wiki/Buffered_oxide_etch

    Buffered oxide etch is commonly used for more controllable etching. [1] Buffering HF with NH 4 F results in a solution with a more stable pH; thus, more stable concentrations of HF and HF − 2, and a more stable etch rate. [2] Some oxides produce insoluble products in HF solutions.

  6. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...

  7. Deep reactive-ion etching - Wikipedia

    en.wikipedia.org/wiki/Deep_reactive-ion_etching

    To etch through a 0.5 mm silicon wafer, for example, 100–1000 etch/deposit steps are needed. The two-phase process causes the sidewalls to undulate with an amplitude of about 100–500 nm. The cycle time can be adjusted: short cycles yield smoother walls, and long cycles yield a higher etch rate.

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