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Tantalum was extensively used in the production of ultra high frequency electron tubes for radio transmitters. Tantalum is capable of capturing oxygen and nitrogen by forming nitrides and oxides and therefore helped to sustain the high vacuum needed for the tubes when used for internal parts such as grids and plates. [40] [69]
Ion milling, or sputter etching, uses lower pressures, often as low as 10 −4 Torr (10 mPa). It bombards the wafer with energetic ions of noble gases, often Ar +, which knock atoms from the substrate by transferring momentum. Because the etching is performed by ions, which approach the wafer approximately from one direction, this process is ...
Tantalum diselenide is a compound made with tantalum and selenium atoms, with chemical formula TaSe 2, which belongs to the family of transition metal dichalcogenides. In contrast to molybdenum disulfide (MoS 2 ) [ 1 ] or rhenium disulfide (ReS 2 ), [ 2 ] tantalum diselenide does not occur spontaneously in nature, but it can be synthesized.
Sputter coating in scanning electron microscopy is a sputter deposition process [clarification needed] to cover a specimen with a thin layer of conducting material, typically a metal, such as a gold/palladium (Au/Pd) alloy. A conductive coating is needed to prevent charging of a specimen with an electron beam in conventional SEM mode (high ...
The bonding process can be used in assembly of electronics, die attachment to heatsinks where high temperature stability is required (e.g. high-power LEDs or concentrated photovoltaics solar panels, soldering together layers of composite armor plates, bonding of large sputtering targets made of ceramics or refractory metals where normal indium based solders cannot be used, and other ...
Tantalum capacitors in different styles: axial, radial and SMD-chip versions (size comparison with a match) 10 μF 30 VDC-rated tantalum capacitors, solid electrolyte epoxy-dipped style. A tantalum electrolytic capacitor is an electrolytic capacitor, a passive component of electronic circuits.
Sputter deposition: a glow plasma discharge (usually localized around the "target" by a magnet) bombards the material sputtering some away as a vapor for subsequent deposition. Pulsed electron deposition: a highly energetic pulsed electron beam ablates material from the target generating a plasma stream under nonequilibrium conditions.
Tantalum pentoxide, also known as tantalum(V) oxide, is the inorganic compound with the formula Ta 2 O 5. It is a white solid that is insoluble in all solvents but is attacked by strong bases and hydrofluoric acid. Ta 2 O 5 is an inert material with a high refractive index and low absorption (i.e. colourless), which makes it useful for coatings ...