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NMR tube cleaning apparatus: 1: NMR tube, 2: Compound residue, 3, 4: NMR tube cap, able to form a vacuum seal, 5: Cleaning Tube fits within NMR tube, 6: Solvent reservoir container, 7: Solvent/solvent level, 8: Vacuum applied, 9: Waste solvent. NMR tubes are hard to clean because of their small bore. They are cleaned best before the sample has ...
NMR tube cleaner. 1: NMR tube 2: Compound residue 3: NMR tube cap 4: NMR tube cap form a vacuum seal 5: Cleaning Tube fits within NMR tube 6: Solvent reservoir container
In liquid-state NMR spectroscopy, the sample to be studied is dissolved in a solvent. Typically, the concentration of the solvent is much higher than the concentration of the solutes of interest. The signal from the solvent can overwhelm that of the solute, and the NMR instrument may not collect any meaningful data.
A mechanical tube cleaning system is a cleaning body that is moved through the tube in order to remove deposits from the tube wall. In the most simple case it is a matter of a brush that is moved in the tube by means of a rod or a flexible spring (device). In large-scale technology and industrial sector, however, several processes have ...
Interface/slow mixing (often performed in an NMR tube). Similar to the above, but instead of one solvent gas-diffusing into another, the two solvents mix (diffuse) by liquid-liquid diffusion. Typically a second solvent is "layered" carefully on top of the solution containing the compound. Over time the two solution mix.
Sonication can be used for the production of nanoparticles, such as nanoemulsions, [5] nanocrystals, liposomes and wax emulsions, as well as for wastewater purification, degassing, extraction of seaweed polysaccharides [1] and plant oil, extraction of anthocyanins and antioxidants, [6] production of biofuels, crude oil desulphurization, cell disruption, polymer and epoxy processing, adhesive ...
A test tube brush or spout brush is a brush used for cleaning test tubes and narrow mouth laboratory glassware, [1] such as graduated cylinders, burettes, and Erlenmeyer flasks. It is composed of nylon , synthetic, or animal fur bristles of various diameters lined against a rather sturdy wire handle with a looped end for hanging.
The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America.
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