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  2. Wafer backgrinding - Wikipedia

    en.wikipedia.org/wiki/Wafer_backgrinding

    Wafer backgrinding is a semiconductor device fabrication step during which wafer thickness is reduced to allow stacking and high-density packaging of integrated circuits (IC). ICs are produced on semiconductor wafers that undergo a multitude of processing steps.

  3. Die singulation - Wikipedia

    en.wikipedia.org/wiki/Die_singulation

    Standard semiconductor manufacturing uses a "dicing after thinning" approach, where wafers are first thinned before they are diced. The wafer is ground down in a process called back side grinding (BSG) before it is diced. [1] The size of the die left on the tape may range from 35 mm on a side (very large) to 0.1 mm square (very small).

  4. Semiconductor device fabrication - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_device...

    During the transition from 200 mm to 300 mm wafers in 2001, many bridge tools were used which could process both 200 mm and 300 mm wafers. [74] At the time, 18 companies could manufacture chips in the leading edge 130nm process. [75] In 2006, 450 mm wafers were expected to be adopted in 2012, and 675 mm wafers were expected to be used by 2021.

  5. Lift-off (microtechnology) - Wikipedia

    en.wikipedia.org/wiki/Lift-off_(microtechnology)

    The lift-off process in microstructuring technology is a method of creating structures (patterning) of a target material on the surface of a substrate (e.g. wafer) using a sacrificial material (e.g. photoresist). It is an additive technique as opposed to more traditional subtracting technique like etching.

  6. Chemical-mechanical polishing - Wikipedia

    en.wikipedia.org/wiki/Chemical-mechanical_polishing

    This process comes in a sequence pattern as follows. First, the isolation trench pattern is transferred to the silicon wafer. Oxide is deposited on the wafer in the shape of trenches. A photo mask, composed of silicon nitride, is patterned on the top of this sacrificial oxide. A second layer is added to the wafer to create a planar surface.

  7. Disco Corporation - Wikipedia

    en.wikipedia.org/wiki/Disco_Corporation

    DISCO Corporation (株式会社ディスコ, Kabushiki-gaisha Disuko) is a Japanese precision tools maker, especially for the semiconductor production industry.. The company makes dicing saws and laser saws to cut semiconductor silicon wafers and other materials; grinders to process silicon and compound semiconductor wafers to ultra-thin levels; polishing machines to remove the grinding damage ...

  8. Die preparation - Wikipedia

    en.wikipedia.org/wiki/Die_preparation

    Wafer mounting is a step that is performed during the die preparation of a wafer as part of the process of semiconductor fabrication. During this step, the wafer is mounted on a plastic tape that is attached to a ring. Wafer mounting is performed right before the wafer is cut into separate dies. The adhesive film upon which the wafer is mounted ...

  9. Wafer fabrication - Wikipedia

    en.wikipedia.org/wiki/Wafer_fabrication

    Wafer fabrication is a procedure composed of many repeated sequential processes to produce complete electrical or photonic circuits on semiconductor wafers in a semiconductor device fabrication process. Examples include production of radio frequency amplifiers, LEDs, optical computer components, and microprocessors for computers. Wafer ...