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Systems of electrostatic lenses can be designed in the same way as optical lenses, so electrostatic lenses easily magnify or converge the electron trajectories. An electrostatic lens can also be used to focus an ion beam, for example to make a microbeam for irradiating individual cells .
Most widespread instruments are using liquid metal ion sources (LMIS), especially gallium ion sources. Ion sources based on elemental gold and iridium are also available. In a gallium LMIS, gallium metal is placed in contact with a tungsten needle, and heated gallium wets the tungsten and flows to the tip of the needle, where the opposing forces of surface tension and electric field form the ...
Ion beam analysis (IBA) is an important family of modern analytical techniques involving the use of MeV ion beams to probe the composition and obtain elemental depth profiles in the near-surface layer of solids. IBA is not restricted to MeV energy ranges.
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]
A small ion beam rocket being tested by NASA. An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely ...
The einzel lens principle in a simplified form was also used as a focusing mechanism in display and television cathode ray tubes, [3] [4] and has the advantage of providing a good sharply focused spot throughout the useful life of the tube's electron gun, with minimal or no readjustment needed (many monochrome TVs did not have or need focus controls), although in high-resolution monochrome ...
Learn how to download and install or uninstall the Desktop Gold software and if your computer meets the system requirements.
Ion-beam lithography offers higher resolution patterning than UV, X-ray, or electron beam lithography because these heavier particles have more momentum. This gives the ion beam a smaller wavelength than even an e-beam and therefore almost no diffraction. The momentum also reduces scattering in the target and in any residual gas.