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Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.
The coatings are mostly deposited by cathodic arc deposition or magnetron sputtering. Even though most TiAlN and AlTiN coatings are industrially synthesized using alloy targets with specific percentages of aluminium and titanium it is possible to produce TiAlN coatings with pure Al and Ti targets using a cathodic arc deposition technique.
As Staff Scientist and since 2001 Group Leader, he worked in various fields of ion beam and plasma applications, including plasma immersion ion implantation and deposition [4] and plasma diagnostics of vacuum arcs. [5] His text book on cathodic arcs [6] and his generalized structure zone diagram [7] are highly cited.
Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]
Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum ).
Titanium nitride (TiN; sometimes known as tinite) is an extremely hard ceramic material, often used as a physical vapor deposition (PVD) coating on titanium alloys, steel, carbide, and aluminium components to improve the substrate's surface properties.
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