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  2. RCA clean - Wikipedia

    en.wikipedia.org/wiki/RCA_clean

    The first step (called SC-1, where SC stands for Standard Clean) is performed with a solution of (ratios may vary) [2] 5 parts of deionized water; 1 part of ammonia water, (29% by weight of NH 3) 1 part of aqueous H 2 O 2 (hydrogen peroxide, 30%) at 75 or 80 °C [1] typically for 10 minutes. This base-peroxide mixture removes organic residues.

  3. Cleanroom - Wikipedia

    en.wikipedia.org/wiki/Cleanroom

    By comparison, an ISO 14644-1 level 1 certified cleanroom permits no particles in that size range, and just 12 particles for each cubic meter of 0.3 μm and smaller. Semiconductor facilities often get by with level 7 or 5, while level 1 facilities are exceedingly rare.

  4. ISO 14644 - Wikipedia

    en.wikipedia.org/wiki/ISO_14644

    After ANSI and IEST petitioned to ISO for new standards, the first document of ISO 14644 was published in 1999, ISO 14644-1. [1] In 2000, ISO 14644-2 was published, which began the process of FED-STD-209E being canceled. On November 29, 2001, the document was canceled and superseded by ISO 14644-1 and ISO 14644-2. [2] ISO 14644 is now composed of

  5. Semiconductor fabrication plant - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_fabrication...

    Semiconductor fabrication requires many expensive devices. Estimates put the cost of building a new fab at over one billion U.S. dollars with values as high as $3–4 billion not being uncommon. For example, TSMC invested $9.3 billion in its Fab15 in Taiwan. [2] The same company estimations suggest that their future fab might cost $20 billion. [3]

  6. List of semiconductor scale examples - Wikipedia

    en.wikipedia.org/wiki/List_of_semiconductor...

    Oxide thickness [1] MOSFET logic Researcher(s) Organization Ref; June 1960: 20,000 nm: 100 nm: PMOS: Mohamed M. Atalla, Dawon Kahng: Bell Telephone Laboratories [2] [3] NMOS: 10,000 nm: 100 nm: PMOS Mohamed M. Atalla, Dawon Kahng: Bell Telephone Laboratories [4] NMOS May 1965: 8,000 nm 150 nm: NMOS Chih-Tang Sah, Otto Leistiko, A.S. Grove ...

  7. International Technology Roadmap for Semiconductors - Wikipedia

    en.wikipedia.org/wiki/International_Technology...

    For several years, the Semiconductor Industry Association (SIA) gave this responsibility of coordination to the United States, which led to the creation of an American style roadmap, the National Technology Roadmap for Semiconductors (NTRS). [5] The first semiconductor roadmap, published by the SIA in 1993.

  8. Cleanliness suitability - Wikipedia

    en.wikipedia.org/wiki/Cleanliness_suitability

    Cleanliness suitability describes the suitability of operating materials and ventilation and air conditioning components for use in cleanrooms where the air cleanliness and other parameters are controlled by way of technical regulations. Tests are carried out to determine this. [1] [2]

  9. ISO 14698 - Wikipedia

    en.wikipedia.org/wiki/ISO_14698

    ISO 14698-1 was first written in 2003. ISO 14698-1 describes the principles and basic methodology for a formal system to assess and control biocontamination, where cleanroom technology is applied, in order that biocontamination in zones at risk can be monitored in a reproducible way and appropriate control measures can be selected.