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  2. Vacuum flange - Wikipedia

    en.wikipedia.org/wiki/Vacuum_flange

    A vacuum flange is a flange at the end of a tube used to connect vacuum chambers, tubing and vacuum pumps to each other. Vacuum flanges are used for scientific and industrial applications to allow various pieces of equipment to interact via physical connections and for vacuum maintenance, monitoring, and manipulation from outside a vacuum's chamber.

  3. Ultra-high vacuum - Wikipedia

    en.wikipedia.org/wiki/Ultra-high_vacuum

    Ultra-high vacuum (often spelled ultrahigh in American English, UHV) is the vacuum regime characterised by pressures lower than about 1 × 10 −6 pascals (1.0 × 10 −8 mbar; 7.5 × 10 −9 Torr). UHV conditions are created by pumping the gas out of a UHV chamber.

  4. Edwards Vacuum - Wikipedia

    en.wikipedia.org/wiki/Edwards_Vacuum

    When World War II began, German patents were voided in the UK, which meant Edwards was cut off from their suppliers. This led the company to begin manufacturing its own products in 1939. The firm was rebranded W Edwards and Co in 1940, then Edwards High Vacuum International Ltd in 1950, and moved from London to Crawley in 1953. [2] [18] [3] [19]

  5. Vacuum engineering - Wikipedia

    en.wikipedia.org/wiki/Vacuum_engineering

    Vacuum systems usually consist of gauges, vapor jet and pumps, vapor traps and valves along with other extensional piping. A vessel that is operating under vacuum system may be any of these types such as processing tank, steam simulator, particle accelerator, or any other type of space that has an enclosed chamber to maintain the system in less than atmospheric gas pressure.

  6. Gate valve - Wikipedia

    en.wikipedia.org/wiki/Gate_valve

    Gate valves may have flanged ends drilled according to pipeline-compatible flange dimensional standards. Gate valves are typically constructed from cast iron, cast carbon steel, ductile iron, gunmetal, stainless steel, alloy steels, and forged steels. All-metal gate valves are used in ultra-high vacuum chambers to isolate regions of the chamber ...

  7. Vacuum - Wikipedia

    en.wikipedia.org/wiki/Vacuum

    High to ultra-high vacuum removes the obstruction of air, allowing particle beams to deposit or remove materials without contamination. This is the principle behind chemical vapor deposition , physical vapor deposition , and dry etching which are essential to the fabrication of semiconductors and optical coatings , and to surface science .

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