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  2. Simon Sze - Wikipedia

    en.wikipedia.org/wiki/Simon_Sze

    Sze worked for Bell Labs until 1990, after which he returned to Taiwan and joined the faculty of National Chiao Tung University. [1] He is well known for his work in semiconductor physics and technology, including his 1967 invention (with Dawon Kahng) of the floating-gate transistor, [2] now widely used in non-volatile semiconductor memory devices.

  3. Semiconductor - Wikipedia

    en.wikipedia.org/wiki/Semiconductor

    Simon Sze stated that Braun's research was the earliest systematic study of semiconductor devices. [40] Also in 1874, Arthur Schuster found that a copper oxide layer on wires had rectification properties that ceased when the wires are cleaned. William Grylls Adams and Richard Evans Day observed the photovoltaic effect in selenium in 1876. [41]

  4. List of semiconductor scale examples - Wikipedia

    en.wikipedia.org/wiki/List_of_semiconductor...

    Samsung and TSMC began mass production of 7 nm devices in 2018. [ 126 ] Apple A12 and Huawei Kirin 980 mobile processors, both released in 2018, use 7 nm chips manufactured by TSMC.

  5. Semiconductor device - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_device

    A semiconductor device is an electronic component that relies on the electronic properties of a semiconductor material (primarily silicon, germanium, and gallium arsenide, as well as organic semiconductors) for its function. Its conductivity lies between conductors and insulators.

  6. 3 nm process - Wikipedia

    en.wikipedia.org/wiki/3_nm_process

    In 2003, a research team at NEC fabricated the first MOSFETs with a channel length of 3 nm, using the PMOS and NMOS processes. [20] [21] In 2006, a team from the Korea Advanced Institute of Science and Technology (KAIST) and the National Nano Fab Center, developed a 3 nm width multi-gate MOSFET, the world's smallest nanoelectronic device, based on gate-all-around technology.

  7. Dawon Kahng - Wikipedia

    en.wikipedia.org/wiki/Dawon_Kahng

    He was a researcher at Bell Telephone Laboratories in Murray Hill, New Jersey, and he invented MOSFET (metal–oxide–semiconductor field-effect transistor), which is the basic element in most of today's electronic equipment, with Mohamed Atalla in 1959. [4] They fabricated both PMOS and NMOS devices with a 20 μm process. [5]

  8. Two-photon photovoltaic effect - Wikipedia

    en.wikipedia.org/wiki/Two-photon_photovoltaic_effect

    Where two differently-doped regions exist in the same crystal, a semiconductor junction is created. The development of these junctions is the basis of diodes, transistors and all modern electronics. Examples of semiconductors are silicon, germanium, gallium arsenide. After silicon, gallium arsenide is the second most common semiconductor. [3]

  9. Metal–semiconductor junction - Wikipedia

    en.wikipedia.org/wiki/Metal–semiconductor_junction

    The rectifying metal–semiconductor junction forms a Schottky barrier, making a device known as a Schottky diode, while the non-rectifying junction is called an ohmic contact. [1] (In contrast, a rectifying semiconductor–semiconductor junction, the most common semiconductor device today, is known as a p–n junction.)

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