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  2. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    Electron-beam physical vapor deposition, or EBPVD, is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase.

  3. Electron beam-induced deposition - Wikipedia

    en.wikipedia.org/wiki/Electron_beam-induced...

    Electron-beam-induced deposition (EBID) is a process of decomposing gaseous molecules by an electron beam leading to deposition of non-volatile fragments onto a nearby substrate. The electron beam is usually provided by a scanning electron microscope , which results in high spatial accuracy (potentially below one nanometer) and the possibility ...

  4. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  5. Electron-beam technology - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_technology

    Electron-beam machining is a process in which high-velocity electrons are concentrated into a narrow beam with a very high planar power density. The beam cross-section is then focused and directed toward the work piece, creating heat and vaporizing the material. Electron-beam machining can be used to accurately cut or bore a wide variety of metals.

  6. Evaporation (deposition) - Wikipedia

    en.wikipedia.org/wiki/Evaporation_(deposition)

    Molecular beam epitaxy is an advanced form of thermal evaporation. In the electron-beam method, the source is heated by an electron beam with an energy up to 15 keV. In flash evaporation, a fine wire or powder of source material is fed continuously onto a hot ceramic or metallic bar, and evaporates on contact.

  7. Electron-beam processing - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_processing

    The basic components of a typical electron-beam processing device include: [1] an electron gun (consisting of a cathode, grid, and anode), used to generate and accelerate the primary beam; and, a magnetic optical (focusing and deflection) system, used for controlling the way in which the electron beam impinges on the material being processed ...

  8. Topological insulator - Wikipedia

    en.wikipedia.org/wiki/Topological_insulator

    Topological insulators can be grown using different methods such as metal-organic chemical vapor deposition (MOCVD), [67] physical vapor deposition (PVD), [68] solvothermal synthesis, [69] sonochemical technique [70] and molecular beam epitaxy. Schematic of the components of a MBE system (MBE). [34] MBE has so far been the most common ...

  9. Low-energy electron diffraction - Wikipedia

    en.wikipedia.org/wiki/Low-energy_electron...

    Also seen is the electron gun that generates the primary electron beam; it covers up parts of the screen. Low-energy electron diffraction ( LEED ) is a technique for the determination of the surface structure of single-crystalline materials by bombardment with a collimated beam of low-energy electrons (30–200 eV) [ 1 ] and observation of ...