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2. Photoresist - Wikipedia

   en.wikipedia.org/wiki/Photoresist

   One very common positive photoresist used with the I, G and H-lines from a mercury-vapor lamp is based on a mixture of diazonaphthoquinone (DNQ) and novolac resin (a phenol formaldehyde resin). DNQ inhibits the dissolution of the novolac resin, but upon exposure to light, the dissolution rate increases even beyond that of pure novolac.

3. Chemistry of photolithography - Wikipedia

   en.wikipedia.org/wiki/Chemistry_of_photolithography

   Positive photoresists are composed of a novolac resin, ethyl lactate solvent, and Diazonaphthaquinone (DQ) as the photoactive compound. [9] Positive photoresist reacts with light to cause the polymer to break down and become soluble in a developer solution. Positive resist has better resistance to etchant than negative photoresist.

4. Diazonaphthoquinone - Wikipedia

   en.wikipedia.org/wiki/Diazonaphthoquinone

   In this way, DNQ has become an important reagent in photoresist technology in the semiconductor industry. [1] Diazonaphthoquinone sulfonic acid esters are components of common photoresist materials. Such photoresists are used in the manufacture of semiconductors. [2] [3] [4] In this application DNQs are mixed with Novolac resin, a type of ...

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8. Phenol formaldehyde resin - Wikipedia

   en.wikipedia.org/wiki/Phenol_formaldehyde_resin

   In either case, the curing agent is a source of formaldehyde which provides bridges between novolac chains, eventually completely crosslinking the system. [2] Novolacs have multiple uses as tire tackifier, high temperature resin, binder for carbon bonded refractories, carbon brakes, photoresists and as a curing agent for epoxy resins.

9. Amazon shoppers love this gentle detox face mask - AOL

   www.aol.com/article/lifestyle/2020/12/18/gentle...

   If you need a detoxifying face mask that helps your skin look and feels its best this season, look no further than this charcoal detox mask on Amazon. Amazon shoppers love this gentle detox face ...