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  2. Plasma cutting - Wikipedia

    en.wikipedia.org/wiki/Plasma_cutting

    Plasma cutting. Plasma cutting is a process that cuts through electrically conductive materials by means of an accelerated jet of hot plasma. Typical materials cut with a plasma torch include steel, stainless steel, aluminum, brass and copper, although other conductive metals may be cut as well. Plasma cutting is often used in fabrication shops ...

  3. Spherical Tokamak for Energy Production - Wikipedia

    en.wikipedia.org/wiki/Spherical_Tokamak_for...

    Spherical Tokamak for Energy Production (STEP) is a spherical tokamak fusion plant concept proposed by the United Kingdom Atomic Energy Authority (UKAEA) and funded by the UK government. [ 1 ] [ 2 ] [ 3 ] The project is a proposed DEMO -class successor device to the ITER tokamak proof-of-concept of a fusion plant, the most advanced tokamak ...

  4. Plasma gasification - Wikipedia

    en.wikipedia.org/wiki/Plasma_gasification

    Plasma gasification is an extreme thermal process using plasma which converts organic matter into a syngas (synthesis gas) which is primarily made up of hydrogen and carbon monoxide. A plasma torch powered by an electric arc is used to ionize gas and catalyze organic matter into syngas , with slag [ 1 ] [ 2 ] [ 3 ] remaining as a byproduct.

  5. Plasma-enhanced chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Plasma-enhanced_chemical...

    PECVD machine at LAAS technological facility in Toulouse, France. Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases.

  6. Ethylenediaminetetraacetic acid - Wikipedia

    en.wikipedia.org/wiki/Ethylenediaminetetraacetic...

    Ethylenediaminetetraacetic acid (EDTA), also called EDTA acid after its own abbreviation, is an aminopolycarboxylic acid with the formula [CH 2 N(CH 2 CO 2 H) 2] 2.This white, water-insoluble solid is widely used to bind to iron (Fe 2+ /Fe 3+) and calcium ions (Ca 2+), forming water-soluble complexes even at neutral pH.

  7. Plasma etching - Wikipedia

    en.wikipedia.org/wiki/Plasma_etching

    A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. A plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine -bearing gas, using a high frequency electric field, typically 13.56 MHz. A silicon wafer is placed in the plasma etcher, and the air is evacuated from the process ...

  8. Oxy-fuel welding and cutting - Wikipedia

    en.wikipedia.org/wiki/Oxy-fuel_welding_and_cutting

    Oxy-fuel welding (commonly called oxyacetylene welding, oxy welding, or gas welding in the United States) and oxy-fuel cutting are processes that use fuel gases (or liquid fuels such as gasoline or petrol, diesel, biodiesel, kerosene, etc) and oxygen to weld or cut metals. French engineers Edmond Fouché and Charles Picard became the first to ...

  9. Plasma ashing - Wikipedia

    en.wikipedia.org/wiki/Plasma_ashing

    In semiconductor manufacturing plasma ashing is the process of removing the photoresist (light sensitive coating) from an etched wafer. Using a plasma source, a monatomic (single atom) substance known as a reactive species is generated. Oxygen or fluorine are the most common reactive species. Other gases used are N2/H2 where the H2 portion is 2 ...

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