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A SÜSS MicroTec MA6 mask aligner. An aligner, or mask aligner, is a system that produces integrated circuits (IC) using the photolithography process. It holds the photomask over the silicon wafer while a bright light is shone through the mask and onto the photoresist. The "alignment" refers to the ability to place the mask over precisely the ...
The next problem was how to align the mask, as the system focussed only UV light. This was solved by adding a dielectric coating that reflected the UV but not visible light. A separate lamp was used during the alignment process, with the light passing through the optics to the microscope that the operator used to align the mask. [17]
The first mask aligner, which enabled double-sided exposure, was invented in 1974. Suss MicroTec, whose name already stood for photolithography in the research and development sector, now also focused on customers from the manufacturing industry. In 1975, the first mask aligner for mass production was developed, the MJB55. [3]
The mask cost strongly benefits from the use of multiple patterning. The EUV single exposure mask has smaller features which take much longer to write than the immersion mask. Even though mask features are 4x larger than wafer features, the number of shots is exponentially increased for much smaller features.
In semiconductor electronics fabrication technology, a self-aligned gate is a transistor manufacturing approach whereby the gate electrode of a MOSFET (metal–oxide–semiconductor field-effect transistor) is used as a mask for the doping of the source and drain regions. This technique ensures that the gate is naturally and precisely aligned ...
Contact masks have traditionally been fairly large (>100 mm), but it is possible that alignment tolerances may require smaller mask sizes to allow stepping between exposures. As in nanoimprint lithography, the mask needs to have roughly the same feature size as the desired image.
The smaller field of electron beam writing makes for very slow pattern generation compared with photolithography (the current standard) because more exposure fields must be scanned to form the final pattern area (≤mm 2 for electron beam vs. ≥40 mm 2 for an optical mask projection scanner). The stage moves in between field scans.
East View Geospatial (EVG), formerly East View Cartographic (EVC), is a provider of worldwide maps, geospatial data and geographic information systems (GIS) services. EVG's holdings include all types of geospatial data including vector & raster data, digital elevation models (DEM), satellite & aerial imagery, topographic maps, nautical & aeronautical charts, geological maps, bathymetric data ...