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Although nearly 100% sulfuric acid solutions can be made, the subsequent loss of SO 3 at the boiling point brings the concentration to 98.3% acid. The 98.3% grade, which is more stable in storage, is the usual form of what is described as "concentrated sulfuric acid".
Hummers' method is a chemical process that can be used to generate graphite oxide through the addition of potassium permanganate to a solution of graphite, sodium nitrate, and sulfuric acid. It is commonly used by engineering and lab technicians as a reliable method of producing quantities of graphite oxide.
In titrations, the concentration of analyte in solution can be determined by titrating the standard solution against the analyte solution to determine the threshold of neutralization. [9] For example, to calculate the concentration of hydrogen chloride, a standard solution of known concentration, such as 0.5 M sodium hydroxide, is titrated ...
This page contains tables of azeotrope data for various binary and ternary mixtures of solvents. The data include the composition of a mixture by weight (in binary azeotropes, when only one fraction is given, it is the fraction of the second component), the boiling point (b.p.) of a component, the boiling point of a mixture, and the specific gravity of the mixture.
If the concentration of a sulfuric acid solution is c(H 2 SO 4) = 1 mol/L, then its normality is 2 N. It can also be called a "2 normal" solution. It can also be called a "2 normal" solution. Similarly, for a solution with c (H 3 PO 4 ) = 1 mol/L, the normality is 3 N because phosphoric acid contains 3 acidic H atoms.
Sample preparation for mass spectrometry is used for the optimization of a sample for analysis in a mass spectrometer (MS). Each ionization method has certain factors that must be considered for that method to be successful, such as volume, concentration, sample phase, and composition of the analyte solution. Quite possibly the most important ...
Dialysis is the process used to change the matrix of molecules in a sample by differentiating molecules by the classification of size. [6] [7] It relies on diffusion, which is the random, thermal movement of molecules in solution (Brownian motion) that leads to the net movement of molecules from an area of higher concentration to a lower concentration until equilibrium is reached.
Etching is a critically important process module in fabrication, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography.