Search results
Results from the WOW.Com Content Network
Whereas comparable conventional nano-structured (Ti,Al)N coatings have a hardness of 25 GPa and a Young's modulus of 460 GPa, the hardness of the new HIPIMS coating is higher than 30 GPa with a Young's modulus of 368 GPa. The ratio between hardness and Young's modulus is a measure of the toughness properties of the coating.
Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...
To provide technical excellence by providing a global forum to inform, educate and engage the members, the technical community and the public on all aspects of vacuum coating, surface engineering and related technologies. [2] Headquarters: P.O. Box 10628: Location
The act of applying a thin film to a surface is thin-film deposition – any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. "Thin" is a relative term, but most deposition techniques control layer thickness within a few tens of nanometres .
Plasma (argon-only on the left, argon and silane on the right) inside a prototype LEPECVD reactor at the LNESS laboratory in Como, Italy.. Low-energy plasma-enhanced chemical vapor deposition (LEPECVD) is a plasma-enhanced chemical vapor deposition technique used for the epitaxial deposition of thin semiconductor (silicon, germanium and SiGe alloys) films.
Surface finishing is often one of the final steps taken when working metal and is essential for guaranteeing that metal components meet the requirements of the necessary finish. Surface finishing processes can be categorized by how they affect the workpiece: Removing or reshaping finishing; Adding or altering finishing; Coating Methods
Electrophoretic deposition (EPD), is a term for a broad range of industrial processes which includes electrocoating, cathodic electrodeposition, anodic electrodeposition, and electrophoretic coating, or electrophoretic painting.
A crucial issue for a roll-to-roll thin-film cell production system is the deposition rate of the microcrystalline layer, and this can be tackled using four approaches: [5] very high frequency plasma-enhanced chemical vapour deposition (VHF-PECVD) microwave -PECVD; hot wire chemical vapour deposition (hot-wire CVD)