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  2. List of laser types - Wikipedia

    en.wikipedia.org/wiki/List_of_laser_types

    Laser types with distinct laser lines are shown above the wavelength bar, while below are shown lasers that can emit in a wavelength range. The height of the lines and bars gives an indication of the maximal power/pulse energy commercially available, while the color codifies the type of laser material (see the figure description for details).

  3. Blue laser - Wikipedia

    en.wikipedia.org/wiki/Blue_laser

    Lasers emitting wavelengths below 445 nm appear violet, but are nonetheless also called blue lasers. Violet light's 405 nm short wavelength, on the visible spectrum, causes fluorescence in some chemicals, like radiation in the ultraviolet ("black light") spectrum (wavelengths less than 400 nm).

  4. Laser pointer - Wikipedia

    en.wikipedia.org/wiki/Laser_pointer

    Red (635 nm), blueish violet (445 nm), and green (520 nm) laser pointers. A laser pointer or laser pen is a (typically battery-powered) handheld device that uses a laser diode to emit a narrow low-power visible laser beam (i.e. coherent light) to highlight something of interest with a small bright colored spot.

  5. Ultra Density Optical - Wikipedia

    en.wikipedia.org/wiki/Ultra_Density_Optical

    This is due to the shorter wavelength (405 nm) of the blue-violet laser employed. MOs use a 650 nm-wavelength red laser. Because its beam width is shorter when burning to a disc than a red-laser for MO, a blue-violet laser allows more information to be stored digitally in the same amount of space. Current generations of UDO2 media store up to ...

  6. Extreme ultraviolet lithography - Wikipedia

    en.wikipedia.org/wiki/Extreme_ultraviolet...

    Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

  7. Spectral power distribution - Wikipedia

    en.wikipedia.org/wiki/Spectral_power_distribution

    Mathematically, for the spectral power distribution of a radiant exitance or irradiance one may write: =where M(λ) is the spectral irradiance (or exitance) of the light (SI units: W/m 2 = kg·m −1 ·s −3); Φ is the radiant flux of the source (SI unit: watt, W); A is the area over which the radiant flux is integrated (SI unit: square meter, m 2); and λ is the wavelength (SI unit: meter, m).

  8. UBV photometric system - Wikipedia

    en.wikipedia.org/wiki/UBV_photometric_system

    The filters are selected so that the mean wavelengths of response functions (at which magnitudes are measured to mean precision) are 364 nm for U, 442 nm for B, 540 nm for V. Zero-points were calibrated in the B−V (B minus V) and U−B (U minus B) color indices selecting such A0 main sequence stars which are not affected by interstellar ...

  9. Refractive index and extinction coefficient of thin film ...

    en.wikipedia.org/wiki/Refractive_index_and...

    The n(λ) and k(λ) spectra of each film are obtained along with film thickness, over a wide range of wavelengths from deep ultraviolet to near infrared wavelengths (190–1000 nm). In the following examples, the notation for theoretical and measured reflectance in the spectral plots is expressed as "R-theor" and "R-meas", respectively.