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  2. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  3. Thin film - Wikipedia

    en.wikipedia.org/wiki/Thin_film

    The act of applying a thin film to a surface is thin-film deposition – any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. "Thin" is a relative term, but most deposition techniques control layer thickness within a few tens of nanometres .

  4. Chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Chemical_vapor_deposition

    Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films .

  5. Sputter deposition - Wikipedia

    en.wikipedia.org/wiki/Sputter_deposition

    Sputter coating in scanning electron microscopy is a sputter deposition process [clarification needed] to cover a specimen with a thin layer of conducting material, typically a metal, such as a gold/palladium (Au/Pd) alloy. A conductive coating is needed to prevent charging of a specimen with an electron beam in conventional SEM mode (high ...

  6. Vacuum deposition - Wikipedia

    en.wikipedia.org/wiki/Vacuum_deposition

    When the vapor source is a liquid or solid, the process is called physical vapor deposition (PVD), [3] which is used in semiconductor devices, thin-film solar panels, and glass coatings. [4] When the source is a chemical vapor precursor, the process is called chemical vapor deposition (CVD).

  7. Electrophoretic deposition - Wikipedia

    en.wikipedia.org/wiki/Electrophoretic_deposition

    It can be determined by plotting the film build of a given system versus coating temperature keeping the coating time and voltage application profile constant. At temperatures below the coalescence temperature, film growth behavior and rupturing behavior is quite different from the usual practice as a result of porous deposition.

  8. Coating - Wikipedia

    en.wikipedia.org/wiki/Coating

    Limiting coating area is crucial in some applications, such as printing. "Roll-to-roll" or "web-based" coating is the process of applying a thin film of functional material to a substrate on a roll, such as paper, fabric, film, foil, or sheet stock. This continuous process is highly efficient for producing large volumes of coated materials ...

  9. Cathodic arc deposition - Wikipedia

    en.wikipedia.org/wiki/Cathodic_arc_deposition

    Cathodic arc deposition is actively used to synthesize extremely hard films to protect the surface of cutting tools and extend their life significantly. A wide variety of thin hard-film, Superhard coatings and nanocomposite coatings can be synthesized by this technology including TiN, TiAlN, CrN, ZrN, AlCrTiN and TiAlSiN.

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