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Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films .
When the vapor source is a liquid or solid, the process is called physical vapor deposition (PVD), [3] which is used in semiconductor devices, thin-film solar panels, and glass coatings. [4] When the source is a chemical vapor precursor, the process is called chemical vapor deposition (CVD).
Download as PDF; Printable version ... Help. Category for chemical vapor deposition (CVD), also known as chemical vapour ... Pages in category "Chemical vapor deposition"
Chalcogenide chemical vapor deposition is a proposed technology for depositing thin films of chalcogenides, i.e. materials derived from sulfides, selenides, and tellurides. Conventional CVD can be used to deposit films of most metals, many non-metallic elements (notably silicon ) as well as a wide range of compounds including carbides, nitrides ...
In the metal organic chemical vapor deposition (MOCVD) technique, reactant gases are combined at elevated temperatures in the reactor to cause a chemical interaction, resulting in the deposition of materials on the substrate. A reactor is a chamber made of a material that does not react with the chemicals being used.
In chemistry, a precursor is a compound that contributes in a chemical reaction and produces another compound, or a chemical substance that gives rise to another more significant chemical product. Since several years metal-organic compounds are widely used as molecular precursors for the chemical vapor deposition process (MOCVD).
The laser ablation method yields around 70% and produces primarily single-walled carbon nanotubes with a controllable diameter determined by the reaction temperature. However, it is more expensive than either arc discharge or chemical vapor deposition. [4]
Chemical vapor deposition of ruthenium is a method to deposit thin layers of ruthenium on substrates by Chemical vapor deposition (CVD). A unique challenge arises in trying to grow impurity-free films of a catalyst in Chemical vapor deposition (CVD). Ruthenium metal activates C–H and C–C bonds, that aids C–H and C–C bond scission.