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Stencil lithography is a novel method of fabricating nanometer scale patterns using nanostencils, stencils (shadow mask) with nanometer size apertures. It is a resist-less, simple, parallel nanolithography process, and it does not involve any heat or chemical treatment of the substrates (unlike resist -based techniques).
A modified uniformly redundant array (MURA) is a type of mask used in coded aperture imaging. They were first proposed by Gottesman and Fenimore in 1989. They were first proposed by Gottesman and Fenimore in 1989.
Example of Carmack's stencil shadowing in Doom 3. Shadow volume is a technique used in 3D computer graphics to add shadows to a rendered scene. It was first proposed by Frank Crow in 1977 [1] as the geometry describing the 3D shape of the region occluded from a light source.
Drawing the scene with shadows can be done in several different ways. If programmable shaders are available, the depth map test may be performed by a fragment shader which simply draws the object in shadow or lighted depending on the result, drawing the scene in a single pass (after an initial earlier pass to generate the shadow map).
Spacer mask: first pattern; deposition; spacer formation by etching; first pattern removal; etching with spacer mask; final pattern. In spacer patterning, a spacer is a film layer formed on the sidewall of a pre-patterned feature. A spacer is formed by deposition or reaction of the film on the previous pattern, followed by etching to remove all ...
A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon ).
Nanosphere lithography (NSL) is an economical technique for generating single-layer hexagonally close packed or similar patterns of nanoscale features. Generally, NSL applies planar ordered arrays of nanometer-sized latex or silica spheres as lithography masks to fabricate nanoparticle arrays. [1]
Maskless lithography has two approaches to project a pattern: rasterized and vectorized. In the first one it utilizes generation of a time-variant intermittent image on an electronically modifiable (virtual) mask that is projected with known means (also known as laser direct imaging and other synonyms). In the vectored approach, direct writing ...