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The 65 nm process is an advanced lithographic node used in volume CMOS semiconductor fabrication. Printed linewidths (i.e. transistor gate lengths) can reach as low as 25 nm on a nominally 65 nm process, while the pitch between two lines may be greater than 130 nm.
The technology used a 32 nm SOI process, two CPU cores per module, and up to four modules, ranging from a quad-core design costing approximately US$130 to a $280 eight-core design. Ambarella Inc. announced the availability of the A7L system-on-a-chip circuit for digital still cameras, providing 1080p60 high-definition video capabilities in ...
reengineered P6-based microarchitecture used in Intel Core 2 and Xeon microprocessors, built on a 65 nm process, supporting x86-64 level SSE instruction and macro-op fusion and enhanced micro-op fusion with a wider front end and decoder, larger out-of-order core and renamed register, support loop stream detector and large shadow register file.
The new six-input LUT represented a tradeoff between better handling of increasingly complex combinational functions, at the expense of a reduction in the absolute number of LUTs per device. The Virtex-5 series is a 65 nm design fabricated in 1.0 V, triple-oxide process technology. [22] [23]
8-bit or 16-bit up to 128 MB GSM/GPRS/EDGE, BT 2.1 EDR, HS 2.0 USB 2007 MT6252: ARM7 (ARMv5) ARM7EJ-S @ 104 MHz 16 KB I-Cache, 16 KB D-Cache No GPU Emb. 32 MB pseudo-SRAM GSM/GPRS Quad-band Class 12 Modem 2005 MT6253: GSM/GPRS Class 12 Modem 2005 MT6516 [1] ARM9 (ARMv5TEJ) 65 nm ARM926EJ-S @ 416 MHz No GPU CSD, GPRS, EDGE, Not 3G compatible 2009
Process variation is the naturally occurring variation in the attributes of transistors (length, widths, oxide thickness) when integrated circuits are fabricated.The amount of process variation becomes particularly pronounced at smaller process nodes (<65 nm) as the variation becomes a larger percentage of the full length or width of the device and as feature sizes approach the fundamental ...
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