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  2. Etching - Wikipedia

    en.wikipedia.org/wiki/Etching

    Etching by Daniel Hopfer, who is believed to have been the first to apply the technique to printmaking. Etching is traditionally the process of using strong acid or mordant to cut into the unprotected parts of a metal surface to create a design in intaglio (incised) in the metal. [1] In modern manufacturing, other chemicals may be used on other ...

  3. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which ...

  4. Wright etch - Wikipedia

    en.wikipedia.org/wiki/Wright_etch

    The Wright etch (also Wright-Jenkins etch) is a preferential etch for revealing defects in <100>- and <111>-oriented, p- and n-type silicon wafers used for making transistors, microprocessors, memories, and other components. Revealing, identifying, and remedying such defects is essential for progress along the path predicted by Moore's law.

  5. Plasma etching - Wikipedia

    en.wikipedia.org/wiki/Plasma_etching

    A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. A plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine -bearing gas, using a high frequency electric field, typically 13.56 MHz. A silicon wafer is placed in the plasma etcher, and the air is evacuated from the process ...

  6. Vapor etching - Wikipedia

    en.wikipedia.org/wiki/Vapor_etching

    Vapor etching. Vapor etching refers to a process used in the fabrication of Microelectromechanical systems (MEMS) and Nanoelectromechanical systems (NEMS). Sacrificial layers are isotropically etched using gaseous acids such as Hydrogen fluoride and Xenon difluoride to release the free standing components of the device.

  7. Category:Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Category:Etching_(micro...

    Category. : Etching (microfabrication) Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Wikimedia Commons has media related to Etching (microfabrication).

  8. Drypoint - Wikipedia

    en.wikipedia.org/wiki/Drypoint

    Drypoint. Drypoint is a printmaking technique of the intaglio family, in which an image is incised into a plate (or "matrix") with a hard-pointed "needle" of sharp metal or diamond point. In principle, the method is practically identical to engraving. The difference is in the use of tools, and that the raised ridge along the furrow is not ...

  9. Electroetching - Wikipedia

    en.wikipedia.org/wiki/Electroetching

    Electroetching is a metal etching process [1] that involves the use of a solution of an electrolyte, an anode, and a cathode. The metal piece to be etched is connected to the positive pole of a source of direct electric current. A piece of the same metal is connected to the negative pole of the direct current source and is called the cathode.