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  2. Cathodic arc deposition - Wikipedia

    en.wikipedia.org/wiki/Cathodic_arc_deposition

    Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.

  3. Ion beam deposition - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_deposition

    Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]

  4. Electrochemical stripping analysis - Wikipedia

    en.wikipedia.org/wiki/Electrochemical_stripping...

    Cathodic stripping voltammetry is a voltammetric method for quantitative determination of specific ionic species. [6] It is similar to the trace analysis method anodic stripping voltammetry , except that for the plating step, the potential is held at an oxidizing potential, and the oxidized species are stripped from the electrode by sweeping ...

  5. Electrophoretic deposition - Wikipedia

    en.wikipedia.org/wiki/Electrophoretic_deposition

    In the cathodic process, positively charged material is deposited on the negatively charged electrode, or cathode. [3] When an electric field is applied, all of the charged species migrate by the process of electrophoresis towards the electrode with the opposite charge. There are several mechanisms by which material can be deposited on the ...

  6. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    The PVD process can be carried out at lower deposition temperatures and without corrosive products, but deposition rates are typically lower. Electron-beam physical vapor deposition, however, yields a high deposition rate from 0.1 to 100 μm/min at relatively low substrate temperatures, with very high material utilization efficiency. The ...

  7. Vacuum deposition - Wikipedia

    en.wikipedia.org/wiki/Vacuum_deposition

    Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum ).

  8. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  9. Plasma electrolytic oxidation - Wikipedia

    en.wikipedia.org/wiki/Plasma_electrolytic_oxidation

    The part to be coated is immersed in a bath of electrolyte which usually consists of a dilute alkaline solution such as KOH. It is electrically connected, so as to become one of the electrodes in the electrochemical cell, with the other "counter-electrode" typically being made from an inert material such as stainless steel, and often consisting of the wall of the bath itself.

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