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Tantalum is a chemical element; it has symbol Ta and atomic number 73. It is named after Tantalus, a figure in Greek mythology. [11] Tantalum is a very hard, ductile, lustrous, blue-gray transition metal that is highly corrosion-resistant. It is part of the refractory metals group, which are widely used as components of strong high-melting ...
historically, used in human or animal experiments to measure and record data Long extension kymograph: historically, used in or human animal experiments to measure and record data Surface plasmon resonance: Label-free detection of molecule binding. Used to determine kinetic constants of the interaction (k a, k d, K D). Can also be used for ...
The niobium-dominant mineral in coltan is columbite (after niobium's original American name columbium), and the tantalum-dominant mineral is tantalite. [1] Tantalum from coltan is used to manufacture tantalum capacitors which are used for mobile phones, personal computers, automotive electronics, and cameras. [2]
The mineral group tantalite [(Fe, Mn)Ta 2 O 6] is the primary source of the chemical element tantalum, a corrosion (heat and acid) resistant metal.It is chemically similar to columbite, and the two are often grouped together as a semi-singular mineral called coltan or "columbite-tantalite" in many mineral guides.
used to separate particles dispersed in a liquid according to their molecular mass and aid in recognition Electrophoresis apparatus: used to detect and classify serum proteins or proteins from any other source. Also used for DNA separation. Chemical laboratory apparatus: for Chemical tests: Chromatography:
Tantalum nitride (TaN) is a chemical compound, a nitride of tantalum. There are multiple phases of compounds, stoichimetrically from Ta 2 N to Ta 3 N 5, including TaN. As a thin film TaN find use as a diffusion barrier and insulating layer between copper interconnects in the back end of line of computer chips. Tantalum nitrides are also used in ...
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Single crystals of TaB, Ta 5 B 6, Ta 3 B 4 or TaB 2 (about 1 cm diameter, 6 cm length) can be produced by the floating zone method. [2] [3]Tantalum boride films can be deposited from a gas mixture of TaCl 5-BCl 3-H 2-Ar in the temperature range 540–800 °C.
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