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  2. Plasma cutting - Wikipedia

    en.wikipedia.org/wiki/Plasma_cutting

    Plasma cutting. Plasma cutting is a process that cuts through electrically conductive materials by means of an accelerated jet of hot plasma. Typical materials cut with a plasma torch include steel, stainless steel, aluminum, brass and copper, although other conductive metals may be cut as well. Plasma cutting is often used in fabrication shops ...

  3. Plasma torch - Wikipedia

    en.wikipedia.org/wiki/Plasma_torch

    Plasma torch. A plasma torch cutter. A plasma torch (also known as a plasma arc, plasma gun, plasma cutter, or plasmatron) is a device for generating a directed flow of plasma. [1][2][3] The plasma jet can be used for applications including plasma cutting, plasma arc welding, plasma spraying, and plasma gasification for waste disposal. [4]

  4. Inductively coupled plasma - Wikipedia

    en.wikipedia.org/wiki/Inductively_coupled_plasma

    Fig. 2. The construction of Inductively Coupled Plasma torch. [3] A: cooling gas tangential flow to the outer quartz tube B: discharge gas flow (usually Ar) C: flow of carrier gas with sample D: induction coil which forms the strong magnetic field inside the torch E: force vectors of the magnetic field F: the plasma torch (the discharge).

  5. Pinch (plasma physics) - Wikipedia

    en.wikipedia.org/wiki/Pinch_(plasma_physics)

    Basic mechanism. This is a basic explanation of how a pinch works. (1) Pinches apply a high voltage and current across a tube. This tube is filled with a gas, typically a fusion fuel such as deuterium. If the product of the voltage & the charge is higher than the ionization energy of the gas the gas ionizes. (2) Current jumps across this gap.

  6. Plasma cleaning - Wikipedia

    en.wikipedia.org/wiki/Plasma_cleaning

    Plasma cleaning. Fig. 1. The surface of a MEMS device is cleaned with bright, blue oxygen plasma in a plasma etcher to rid it of carbon contaminants. (100mTorr, 50W RF) Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from ...

  7. Capacitively coupled plasma - Wikipedia

    en.wikipedia.org/wiki/Capacitively_coupled_plasma

    Capacitively coupled plasma. A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric.

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  9. Spitzer resistivity - Wikipedia

    en.wikipedia.org/wiki/Spitzer_resistivity

    The Spitzer resistivity is a classical model of electrical resistivity based upon electron-ion collisions and it is commonly used in plasma physics. [3][4][5][6][7] The Spitzer resistivity is given by: where is the ionization of nuclei, is the electron charge, is the electron mass, is the Coulomb logarithm, is the electric permittivity of free ...

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