Search results
Results from the WOW.Com Content Network
The economic constraints on such developments do not lend themselves to the continued deployment of three-phase separators as the primary measurement devices. Consequently, viable alternatives to three-phase separators are essential. Industry’s response is the multiphase flow meter (MPFM).
The CEAM Modèle 1950, a French effort to put the StG 45(M) concept into mass production. Chambered in .30 Carbine. The German technicians involved in developing the Sturmgewehr 45 continued their research in France at CEAM. The StG45 mechanism was modified by Ludwig Vorgrimler and Theodor Löffler at the Mulhouse facility between 1946 and 1949.
The medial patellofemoral ligament (MPFL) is one of several ligaments on the medial aspect of the knee.It originates in the superomedial aspect of the patella and inserts in the space between the adductor tubercle and the medial femoral epicondyle.
The 7.62×45mm (designated as the 7,62 × 45 by the C.I.P.) [2] is a rimless bottlenecked intermediate rifle cartridge developed in Czechoslovakia. It is fired by the Czech Vz. 52 rifle , Vz. 52 light machine gun , and ZB-53 machine gun .
The UMP can be converted from 9×19mm Parabellum, .40 S&W, or .45 ACP by changing the barrel, bolt, and magazine. The UMP was previously available in multiple calibres, however with a decline in global use of .40 S&W and .45 ACP, only the 9mm Parabellum variant is in production. Parts are still available for the .40 S&W and .45 ACP calibre ...
The MG 45 barrel was a simple turned part without a locking piece with a lifespan of over 10,000 rounds. The MG 45 development was never completed, so that one has to speak of a prototype. The resulting prototypes remained similar to the earlier MG 42 overall, a deliberate decision made to maintain familiarity.
At the end of 2008, SMIC was the first China-based semiconductor company to move to 45 nm, having licensed the bulk 45 nm process from IBM. In 2008, TSMC moved on to a 40 nm process. Many critical feature sizes are smaller than the wavelength of light used for lithography (i.e., 193 nm and 248 nm).
Derived from the .50-60-400 Joslyn, the cartridge was developed after the unsatisfactory results of the .58 rimfire cartridge for the Springfield Model 1865 rifle. The .50-70 Government cartridge used the Benét internal center-fire primer design and became the official cartridge of the U.S. military in 1866 until being replaced by the .45-70 Government in 1873.