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Image and Scanner Interface Specification (ISIS) is an industry standard interface for image scanning technologies, developed by Pixel Translations in 1990 (which became EMC Corporation's Captiva Software and later acquired by OpenText). [1] ISIS is an open standard for scanner control and a complete image-processing framework.
Windows Image Acquisition (WIA; sometimes also called Windows Imaging Architecture) is a proprietary Microsoft driver model and application programming interface (API) for Microsoft Windows Me and later Windows operating systems that enables graphics software to communicate with imaging hardware such as scanners, digital cameras, and digital video equipment.
It is a computer program that generates lexical analyzers (also known as "scanners" or "lexers"). [ 3 ] [ 4 ] It is frequently used as the lex implementation together with Berkeley Yacc parser generator on BSD -derived operating systems (as both lex and yacc are part of POSIX ), [ 5 ] [ 6 ] [ 7 ] or together with GNU bison (a version of yacc ...
The resolution limit for a 1.35 NA immersion tool operating at 193 nm wavelength is 36 nm. Going beyond this limit to sub-20nm nodes requires multiple patterning. [17] At the 20nm foundry and memory nodes and beyond, double patterning and triple patterning are already being used [when?] with immersion lithography for the densest layers.
Video of the process of scanning and real-time optical character recognition (OCR) with a portable scanner. Optical character recognition or optical character reader (OCR) is the electronic or mechanical conversion of images of typed, handwritten or printed text into machine-encoded text, whether from a scanned document, a photo of a document, a scene photo (for example the text on signs and ...
A programmable logic controller (PLC) or programmable controller is an industrial computer that has been ruggedized and adapted for the control of manufacturing processes, such as assembly lines, machines, robotic devices, or any activity that requires high reliability, ease of programming, and process fault diagnosis.
Hoda Kotb, Norah O'Donnell sign off: 'God-like days' are over for big name anchors Kotb, who anchored the main "Today" program for six years and was an NBC staple for nearly two decades, marked ...
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
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