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IBA (Ion Beam Applications SA) is a medical technology company based in Louvain-la-Neuve. The company was founded in 1986 by Yves Jongen within the Cyclotron Research Center of the University of Louvain (UCLouvain) and became a university spin-off. It employs about 1500 people in 40 locations. [1]
A small ion beam rocket being tested by NASA. An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely ...
Ion beam analysis (IBA) is an important family of modern analytical techniques involving the use of MeV ion beams to probe the composition and obtain elemental depth profiles in the near-surface layer of solids. IBA is not restricted to MeV energy ranges.
The installation of cyclotrons from GE HealthCare and IBA (Ion Beam Applications S.A.), along with proprietary solid targets, establishes TMS Brussels South as a major nuclear medicine production facility, which will serve as the Company’s primary manufacturing site for the Europe Middle East and Africa (EMEA) region and beyond.
A second accelerator, called CYCLONE30, was designed and built by the Cyclotron Research Centre team between 1984 and 1987: mainly designed for industrial and medical applications, it is mainly used for isotope production. [15] [16] Further models of CYCLONE30 were built by Ion Beam Applications. [17]
FEI Company (Field Electron and Ion Company) was an American company that designed, manufactured, and supported microscope technology. Headquartered in Hillsboro, Oregon , FEI had over 2,800 employees and sales and service operations in more than 50 countries around the world.
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2] In the ion source ...
As the input parameters, it needs the ion type and energy (in the range 10 eV – 2 GeV) and the material of one or several target layers. As the output, it lists or plots the three-dimensional distribution of the ions in the solid and its parameters, such as penetration depth, its spread along the ion beam (called straggle) and perpendicular to it, all target atom cascades in the target are ...