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The 65 nm process is an advanced lithographic node used in volume CMOS semiconductor fabrication. Printed linewidths (i.e. transistor gate lengths) can reach as low as 25 nm on a nominally 65 nm process, while the pitch between two lines may be greater than 130 nm.
The technology used a 32 nm SOI process, two CPU cores per module, and up to four modules, ranging from a quad-core design costing approximately US$130 to a $280 eight-core design. Ambarella Inc. announced the availability of the A7L system-on-a-chip circuit for digital still cameras, providing 1080p60 high-definition video capabilities in ...
The reduction to 65 nm reduced the existing 230 mm 2 die based on the 90 nm process to half its current size, about 120 mm 2, greatly reducing IBM's manufacturing cost as well. On 12 March 2007, IBM announced that it started producing 65 nm Cells in its East Fishkill fab. The chips produced there are apparently only for IBMs own Cell blade ...
The new six-input LUT represented a tradeoff between better handling of increasingly complex combinational functions, at the expense of a reduction in the absolute number of LUTs per device. The Virtex-5 series is a 65 nm design fabricated in 1.0 V, triple-oxide process technology. [22] [23]
65 nm process; 140.8 GFLOPS @ 1.1 GHz; Max memory capacity: 16 GB; Peak memory bandwidth: 68 GB/s; Quad-channel 128-bit DDR3; Four-issue superscalar; Two integer and two floating-point execution units; 7-stage integer pipeline and 10-stage floating-point pipeline; 43-bit virtual address and 40-bit physical address
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Yonah is the code name of Intel's first generation 65 nm process CPU cores, based on cores of the earlier Banias (130 nm) / Dothan (90 nm) Pentium M microarchitecture.Yonah CPU cores were used within Intel's Core Solo and Core Duo mobile microprocessor products.
At the end of 2008, SMIC was the first China-based semiconductor company to move to 45 nm, having licensed the bulk 45 nm process from IBM. In 2008, TSMC moved on to a 40 nm process. Many critical feature sizes are smaller than the wavelength of light used for lithography (i.e., 193 nm and 248 nm).