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In video games using procedural world generation, the map seed is a (relatively) short number or text string which is used to procedurally create the game world ("map"). "). This means that while the seed-unique generated map may be many megabytes in size (often generated incrementally and virtually unlimited in potential size), it is possible to reset to the unmodified map, or the unmodified ...
X-ray fluorescence (XRF) is the emission of characteristic "secondary" (or fluorescent) X-rays from a material that has been excited by being bombarded with high-energy X-rays or gamma rays.
This method uses X-ray images for 3D Reconstruction and to develop 3D models with low dose radiations in weight bearing positions. In NSCC algorithm, the preliminary step is calculation of an initial solution. Firstly anatomical regions from the generic object are defined. Secondly, manual 2D contours identification on the radiographs is performed.
The phases obtained this way can be used to generate electron density maps. [114] Anomalous X-ray scattering (MAD or SAD phasing) – the X-ray wavelength may be scanned past an absorption edge [a] of an atom, which changes the scattering in a known way. By recording full sets of reflections at three different wavelengths (far below, far above ...
An X-ray image intensifier (XRII) is an image intensifier that converts X-rays into visible light at higher intensity than the more traditional fluorescent screens can. Such intensifiers are used in X-ray imaging systems (such as fluoroscopes ) to allow low-intensity X-rays to be converted to a conveniently bright visible light output.
A 105 mm shell is radiographied with battery powered portable X-ray generator and flat panel detector. Digital radiography (DR) has existed in various forms (for example, CCD and amorphous Silicon imagers) in the security X-ray inspection field for over 20 years and is steadily replacing the use of film for inspection X-rays in the security and ...
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X-ray lithography is a process used in semiconductor device fabrication industry to selectively remove parts of a thin film of photoresist. It uses X-rays to transfer a geometric pattern from a mask to a light-sensitive chemical photoresist , or simply "resist," on the substrate to reach extremely small topological size of a feature.