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In this section a practical example of a c-TLM measurement is presented. By utilizing photolithography and sputter deposition, metallic c-TLM pads were deposited on the surface of a semiconductor thin film. The gap spacings of the c-TLM pads ranged between 20 μm and 200 μm while step sizes of 20 μm where chosen.
2D TLM example: an incident voltage pulse in two consecutive scattering events. The TLM method is based on Huygens' model of wave propagation and scattering and the analogy between field propagation and transmission lines. Therefore, it considers the computational domain as a mesh of transmission lines, interconnected at nodes.
In practice, direct current methods are more typically used to determine resistance. The three electrode systems such as transistors require more complicated methods for the contact resistance approximation. The most common approach is the transmission line model (TLM).
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IP-XACT, also known as IEEE 1685, [1] is an XML format that defines and describes individual, re-usable electronic circuit designs (individual pieces of intellectual property, or IPs) to facilitate their use in creating integrated circuits (i.e. microchips).