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Vapor degreasing is a surface finishing process. It involves solvents in vapor form to cleanse the workpiece in preparation for further finishing operations.
Trichloroethylene (TCE) is a halocarbon with the formula C 2 HCl 3, commonly used as an industrial metal degreasing solvent. It is a clear, colourless, non-flammable, volatile liquid with a chloroform-like pleasant mild smell [3] and sweet taste. [9] Its IUPAC name is trichloroethene. Trichloroethylene has been sold under a variety of trade names.
Solvent degreasing is a process used to prepare a part for further operations such as electroplating or painting. Typically it uses petroleum , chlorine , dry ice or alcohol based solvents to dissolve the machining fluids and other contaminants that might be on the part.
Usually, the cleaning takes place in a workshop. Several common methods include solvent degreasing, vapor degreasing, and the use of an aqueous parts washer. Companies often want the charging, loading and unloading to be integrated into the production line, which is much more demanding as regards size and throughout the ability of the cleaning ...
It is a solvent for degreasing plastics, optics and on metal surfaces, to remove soldering residues from electronic circuit boards. [8] It is an aggressive solvent with a Kauri-butanol value of 129 which is similar to 1,1,1-trichloroethane .
Tetrachloroethylene can be made by passing chloroform vapour through a red-hot tube, the side products include hexachlorobenzene and hexachloroethane, as reported in 1886. [10] Most tetrachloroethylene is produced by high-temperature chlorinolysis of light hydrocarbons.
Then, chlorinated solvents in vapor degreasers became an industry standard. During the 1980s environmental and safety issues led to the banning of chlorinated solvents for parts cleaning. [2] Aqueous-based cleaning systems took on new prominence that led to many improvements, in the systems and the processes.
It was a supplier of chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), physical vapor deposition (PVD), electrochemical deposition (ECD), ultraviolet thermal processing (UVTP), and surface preparation equipment used in the manufacturing of semiconductors.
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