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Thermal evaporation offers faster evaporation rates than sputtering. Flash evaporation and other methods that use crucibles can deposit thick films. In order to deposit a material, the evaporation system must be able to vaporize it. This makes refractory materials such as tungsten hard to deposit by methods that do not use electron-beam heating ...
Evaporation is a type of vaporization that occurs on the surface of a liquid as it changes into the gas phase. [1] A high concentration of the evaporating substance in the surrounding gas significantly slows down evaporation, such as when humidity affects rate of evaporation of water. [2]
Thermal laser epitaxy: a continuous-wave laser evaporates individual, free-standing elemental sources which then condense upon a substrate. Sputter deposition: a glow plasma discharge (usually localized around the "target" by a magnet) bombards the material sputtering some away as a vapor for subsequent deposition.
The Hertz–Knudsen equation describes the non-dissociative adsorption of a gas molecule on a surface by expressing the variation of the number of molecules impacting on the surfaces per unit of time as a function of the pressure of the gas and other parameters which characterise both the gas phase molecule and the surface: [1] [2]
Another potential problem is that filament degradation in the electron gun results in a non-uniform evaporation rate. However, when vapor deposition is performed at pressures of roughly 10 −4 Torr (1.3 × 10 −4 hPa) or higher, significant scattering of the vapor cloud takes place such that surfaces not in sight of the source can be coated.
Temperature-dependency of the heats of vaporization for water, methanol, benzene, and acetone. In thermodynamics, the enthalpy of vaporization (symbol ∆H vap), also known as the (latent) heat of vaporization or heat of evaporation, is the amount of energy that must be added to a liquid substance to transform a quantity of that substance into a gas.
Evaporation is the elimination of the solvent in form of vapor from a solution. For most evaporation systems, the solvent is water and the heat is provided by steam condensation. [4] In a forced circulation evaporation liquid is constantly circulated through the system.
Thermal laser epitaxy (TLE) is a physical vapor deposition technique that utilizes irradiation from continuous-wave lasers to heat sources locally for growing films on a substrate. [ 1 ] [ 2 ] This technique can be performed under ultra-high vacuum pressure or in the presence of a background atmosphere, such as ozone , to deposit oxide films.
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