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Air abrasion is a dental technique that uses compressed air to propel a thin stream of abrasive particles—often aluminum oxide or silica—through a specialized hand-piece to remove tooth tissue and decay before being suctioned away, similar to sand blasting.
Anodic aluminum oxide, anodic aluminum oxide (AAO), or anodic alumina is a self-organized form of aluminum oxide that has a honeycomb-like structure formed by high density arrays of uniform and parallel pores. The diameter of the pores can be as low as 5 nanometers and as high as several hundred nanometers, and length can be controlled from few ...
A loss of the tooth enamel structure and cavitation may occur if the demineralization phase continues for a long period of time. This disturbance of demineralisation caused by the presence of fermentable carbohydrates continues until the saliva has returned to a normal pH and had sufficient time to penetrate and neutralize the acids within any ...
In 1938, Bodecker introduced the stepwise caries excavation (SWE) technique for treatment of teeth with deep caries for preservation of pulp vitality. [6] This technique is used when most of the decay has been removed from a deep cavity, but some softened dentin and decay remains over the pulp chamber that if removed would expose the pulp and ...
Intraosseous anaesthetic injection involves the deposition of anaesthetic solution directly into the cancellous alveolar bone adjacent to the apex of the root of the tooth to be anaesthetised through a small hole. Additionally, more complex dental procedures like surgery or endodontic therapy (like root canals) might make use of it.
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During atomic layer deposition, a film is grown on a substrate by exposing its surface to alternate gaseous species (typically referred to as precursors or reactants). In contrast to chemical vapor deposition, the precursors are never present simultaneously in the reactor, but they are inserted as a series of sequential, non-overlapping pulses.
Thus, CCVD technique is a true vapor deposition process for making thin film coatings. [2] [3] The CCVD coating process has the ability to deposit thin films in the open atmosphere [4] using inexpensive precursor chemicals in solution leading to continuous, production-line manufacturing. It does not require post-deposition treatment e.g ...