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  2. Photoengraving - Wikipedia

    en.wikipedia.org/wiki/Photoengraving

    A print made in 1907 from a photoengraved plate. It reproduces a sketch of Parga's castle made by Ludwig Salvator.. Photoengraving is a process that uses a light-sensitive photoresist applied to the surface to be engraved to create a mask that protects some areas during a subsequent operation which etches, dissolves, or otherwise removes some or all of the material from the unshielded areas of ...

  3. Photoresist - Wikipedia

    en.wikipedia.org/wiki/Photoresist

    Adherence is the adhesive strength between photoresist and substrate. If the resist comes off the substrate, some features will be missing or damaged. Etching resistance Anti-etching is the ability of a photoresist to resist the high temperature, different pH environment or the ion bombardment in the process of post-modification. Surface tension

  4. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...

  5. Ground (etching) - Wikipedia

    en.wikipedia.org/wiki/Ground_(etching)

    Grounds are made from a variety of materials including tar, asphaltum, paint (including spray paint), oil pastels, and other materials manufactured specifically for etching. [ 1 ] Most commonly, a ground is applied evenly over the surface of the metal sheet (also known as the etching plate), and then removed using scratching and other mark ...

  6. KPR - Wikipedia

    en.wikipedia.org/wiki/KPR

    It is also resistant to acid, ferric chloride and other chemicals used to etch metals. The fundamental method of its use was first described in two US Patents, USP 2610120 [1] and USP 2670287, [2] assigned to the Eastman Kodak Company of Rochester, New York. These photo-resistant resins are formed from cinnamic acid esters, with the most ...

  7. Photolithography - Wikipedia

    en.wikipedia.org/wiki/Photolithography

    The resulting wafer is then "hard-baked" if a non-chemically amplified resist was used, typically at 120 to 180 °C [33] for 20 to 30 minutes. The hard bake solidifies the remaining photoresist, to make a more durable protecting layer in future ion implantation, wet chemical etching, or plasma etching.

  8. Rio Grande (company) - Wikipedia

    en.wikipedia.org/wiki/Rio_Grande_(company)

    Rio Grande, a Berkshire Hathaway Company since 2013, offers jewelry-making supplies. While specializing in silver findings and fabrication materials, the company also provides metalsmithing tools and equipment, jewelry displays and packaging products, jewelry workbenches, casting machines and kilns, soldering and welding torches, gemstones ...

  9. Etching - Wikipedia

    en.wikipedia.org/wiki/Etching

    In traditional pure etching, a metal plate (usually of copper, zinc or steel) is covered with a waxy ground which is resistant to acid. [2] The artist then scratches off the ground with a pointed etching needle [3] where the artist wants a line to appear in the finished piece, exposing the bare metal.

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