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  2. Cathodic arc deposition - Wikipedia

    en.wikipedia.org/wiki/Cathodic_arc_deposition

    Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.

  3. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Cathodic arc deposition: a high-power electric arc discharged at the target (source) material blasts away some into highly ionized vapor to be deposited onto the workpiece. Electron-beam physical vapor deposition : the material to be deposited is heated to a high vapor pressure by electron bombardment in "high" vacuum and is transported by ...

  4. Category:Thin film deposition - Wikipedia

    en.wikipedia.org/wiki/Category:Thin_film_deposition

    Download as PDF; Printable version; ... Pages in category "Thin film deposition" ... Cathodic arc deposition; Chemical bath deposition;

  5. Thin film - Wikipedia

    en.wikipedia.org/wiki/Thin_film

    Cathodic arc deposition (arc-physical vapor deposition), which is a kind of ion beam deposition where an electrical arc is created that blasts ions from the cathode. The arc has an extremely high power density resulting in a high level of ionization (30–100%), multiply charged ions, neutral particles, clusters and macro-particles (droplets).

  6. Vacuum deposition - Wikipedia

    en.wikipedia.org/wiki/Vacuum_deposition

    Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum ).

  7. Ion beam deposition - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_deposition

    Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]

  8. Vacuum arc - Wikipedia

    en.wikipedia.org/wiki/Vacuum_arc

    The thermionic vacuum arc (TVA) is a new type of plasma source, which generates a plasma containing ions with a directed energy. TVA discharges can be ignited in high-vacuum conditions between a heated cathode (electron gun) and an anode (tungsten crucible) containing the material.

  9. Electrodeposition - Wikipedia

    en.wikipedia.org/wiki/Electrodeposition

    Underpotential deposition, a phenomenon of electrodeposition of a species (typically reduction of a metal cation to a solid metal) at a potential less negative than the equilibrium (Nernst) potential for the reduction of this metal

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    related to: cathodic arc deposition pdf printable application template word document
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