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  2. Silicon dioxide - Wikipedia

    en.wikipedia.org/wiki/Silicon_dioxide

    Because silicon dioxide is a native oxide of silicon it is more widely used compared to other semiconductors like gallium arsenide or indium phosphide. Silicon dioxide could be grown on a silicon semiconductor surface. [46] Silicon oxide layers could protect silicon surfaces during diffusion processes, and could be used for diffusion masking ...

  3. Charge trap flash - Wikipedia

    en.wikipedia.org/wiki/Charge_trap_flash

    A trench is then etched and its walls are deposited first with silicon dioxide (blue), then silicon nitride (yellow), then another silicon dioxide (blue) layer, forming the gate dielectric, the charge trap, and the tunnel dielectric in that order. Finally the hole is filled with conducting polysilicon (red) which forms the channel.

  4. List of semiconductor materials - Wikipedia

    en.wikipedia.org/wiki/List_of_semiconductor...

    A compound semiconductor is a semiconductor compound composed of chemical elements of at least two different species. These semiconductors form for example in periodic table groups 13–15 (old groups III–V), for example of elements from the Boron group (old group III, boron, aluminium, gallium, indium) and from group 15 (old group V, nitrogen, phosphorus, arsenic, antimony, bismuth).

  5. Shallow trench isolation - Wikipedia

    en.wikipedia.org/wiki/Shallow_trench_isolation

    STI is created early during the semiconductor device fabrication process, before transistors are formed. The key steps of the STI process involve etching a pattern of trenches in the silicon, depositing one or more dielectric materials (such as silicon dioxide ) to fill the trenches, and removing the excess dielectric using a technique such as ...

  6. Low-κ dielectric - Wikipedia

    en.wikipedia.org/wiki/Low-κ_dielectric

    In semiconductor manufacturing, a low-κ is a material with a small relative dielectric constant (κ, kappa) relative to silicon dioxide.Low-κ dielectric material implementation is one of several strategies used to allow continued scaling of microelectronic devices, colloquially referred to as extending Moore's law.

  7. High-κ dielectric - Wikipedia

    en.wikipedia.org/wiki/High-κ_dielectric

    In the semiconductor industry, the term high-κ dielectric refers to a material with a high dielectric constant (κ, kappa), as compared to silicon dioxide.High-κ dielectrics are used in semiconductor manufacturing processes where they are usually used to replace a silicon dioxide gate dielectric or another dielectric layer of a device.

  8. Semiconductor - Wikipedia

    en.wikipedia.org/wiki/Semiconductor

    A semiconductor is a material that is between the conductor and insulator in ability to conduct electrical current. [1] In many cases their conducting properties may be altered in useful ways by introducing impurities (" doping ") into the crystal structure .

  9. Planar process - Wikipedia

    en.wikipedia.org/wiki/Planar_process

    The planar process is a manufacturing process used in the semiconductor industry to build individual components of a transistor, and in turn, connect those transistors together. It is the primary process by which silicon integrated circuit chips are built, and it is the most commonly used method of producing junctions during the manufacture of ...