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  2. Hydrofluoric acid - Wikipedia

    en.wikipedia.org/wiki/Hydrofluoric_acid

    SiO 2 + 6 HF → H 2 SiF 6 + 2 H 2 O. A 5% to 9% hydrofluoric acid gel is also commonly used to etch all ceramic dental restorations to improve bonding. [6] For similar reasons, dilute hydrofluoric acid is a component of household rust stain remover, in car washes in "wheel cleaner" compounds, in ceramic and fabric rust inhibitors, and in water ...

  3. Hydrogen fluoride - Wikipedia

    en.wikipedia.org/wiki/Hydrogen_fluoride

    Hydrogen fluoride is typically produced by the reaction between sulfuric acid and pure grades of the mineral fluorite: [14] CaF 2 + H 2 SO 4 → 2 HF + CaSO 4. About 20% of manufactured HF is a byproduct of fertilizer production, which generates hexafluorosilicic acid. This acid can be degraded to release HF thermally and by hydrolysis: H 2 SiF ...

  4. Sodium bifluoride - Wikipedia

    en.wikipedia.org/wiki/Sodium_bifluoride

    Sodium bifluoride reacts with water or moist skin to produce hydrofluoric acid. It also gives off hydrofluoric acid and hydrogen gas when it is heated to a gaseous state. The chemical can decompose upon contact with strong acids, strong bases, metal, water, or glass. [3] Sodium bifluoride also engages in violent reactions with chromyl chloride ...

  5. Buffered oxide etch - Wikipedia

    en.wikipedia.org/wiki/Buffered_oxide_etch

    SiO 2 + 4HF + 2NH 4 F → (NH 4) 2 SiF 6 + 2H 2 O. Concentrated HF (typically 49% HF in water) etches silicon dioxide too quickly for good process control and also peels photoresist used in photolithographic patterning. Buffered oxide etch is commonly used for more controllable etching. [1] Buffering HF with NH 4 F results in a solution with a ...

  6. RCA clean - Wikipedia

    en.wikipedia.org/wiki/RCA_clean

    The optional second step (for bare silicon wafers) is a short immersion in a 1:100 or 1:50 solution of aqueous HF (hydrofluoric acid) at 25 °C for about fifteen seconds, in order to remove the thin oxide layer and some fraction of ionic contaminants. If this step is performed without ultra high purity materials and ultra clean containers, it ...

  7. Water-reactive substances - Wikipedia

    en.wikipedia.org/wiki/Water-reactive_substances

    Out of the four stable halogens, only fluorine and chlorine have reduction potentials higher than that of oxygen, allowing them to form hydrofluoric acid and hydrochloric acid directly through reaction with water. [17] The reaction of fluorine with water is especially hazardous, as an addition of fluorine gas to cold water will produce ...

  8. Lead(II) fluoride - Wikipedia

    en.wikipedia.org/wiki/Lead(II)_fluoride

    Lead(II) fluoride can be prepared by treating lead(II) hydroxide or lead(II) carbonate with hydrofluoric acid: [3]. Pb(OH) 2 + 2 HF → PbF 2 + 2 H 2 O Alternatively, it is precipitated by adding hydrofluoric acid to a lead(II) salt solution, or by adding a fluoride salt to a lead salt, such as potassium fluoride to a lead(II) nitrate solution, [4]

  9. Bifluoride - Wikipedia

    en.wikipedia.org/wiki/Bifluoride

    The bifluoride ion has a linear, centrosymmetric structure (D ∞h symmetry), with an F−H bond length of 114 pm. [1] The bond strength is estimated to be greater than 155 kJ/mol. [2] In molecular orbital theory, the atoms are modeled to be held together by a 3-center 4-electron bond (symmetrical hydrogen bond), [3] in a sort of hybrid between a hydrogen bond and a covalent bond.