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Aluminum silicate (or aluminium silicate) is a name commonly applied to chemical compounds which are derived from aluminium oxide, Al 2 O 3 and silicon dioxide, SiO 2 which may be anhydrous or hydrated, naturally occurring as minerals or synthetic. Their chemical formulae are often expressed as xAl 2 O 3 ·ySiO 2 ·zH 2 O. It is known as E ...
Aluminium oxide (or aluminium(III) oxide) is a chemical compound of aluminium and oxygen with the chemical formula Al 2 O 3. It is the most commonly occurring of several aluminium oxides, and specifically identified as aluminium oxide. It is commonly called alumina and may also be called aloxide, aloxite, or alundum in various forms and ...
Because silicon dioxide is a native oxide of silicon it is more widely used compared to other semiconductors like gallium arsenide or indium phosphide. Silicon dioxide could be grown on a silicon semiconductor surface. [46] Silicon oxide layers could protect silicon surfaces during diffusion processes, and could be used for diffusion masking ...
Like most aluminosilicates, the framework is formed by linking of aluminum and silicon atoms by oxides. This linking leads to a 3-dimensional network of Si-O-Al, Si-O-Si, and Al-O-Al linkages. The aluminum centers are negatively charged, which requires an accompanying cation. These cations are hydrated during the formation of the materials.
Metal silicides, silicon halides, and similar inorganic compounds can be prepared by directly reacting elemental silicon or silicon dioxide with stable metals or with halogens. Silanes, compounds of silicon and hydrogen, are often used as strong reducing agents, and can be prepared from aluminum–silicon alloys and hydrochloric acid.
The subunits of colloidal silica particles are typically in the range of 1 to 5 nm. Whether or not these subunits are joined depends on the conditions of polymerization. Initial acidification of a water-glass (sodium silicate) solution yields Si(OH) 4. If the pH is reduced below 7 or if salt is added, then the units tend to fuse together in chains.
Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. It is a mixture of a buffering agent, such as ammonium fluoride NH 4 F, and hydrofluoric acid (HF). Its primary use is in etching thin films of silicon nitride (Si 3 N 4) or silicon dioxide (SiO 2), by the reaction: SiO 2 + 4HF + 2NH 4 F → ...
Aluminium(I) oxide is formed by heating Al and Al 2 O 3 in a vacuum while in the presence of SiO 2 and C, and only by condensing the products. [2] Information is not commonly available on this compound; it is unstable, has complex high-temperature spectra, and is difficult to detect and identify. In reduction, Al 2 O is a major component of ...
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