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  2. Dichlorosilane - Wikipedia

    en.wikipedia.org/wiki/Dichlorosilane

    Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H 2 SiCl 2. In its major use, it is mixed with ammonia (NH 3 ) in LPCVD chambers to grow silicon nitride in semiconductor processing.

  3. Chlorosilane - Wikipedia

    en.wikipedia.org/wiki/Chlorosilane

    The analogous reaction of dimethyldichlorosilane gives siloxane polymers or rings: n (CH 3) 2 SiCl 2 + n H 2 O → [(CH 3) 2 SiO] n + 2n HCl. Many compounds containing Si-Cl bonds can be converted to hydrides using lithium aluminium hydride, This kind of conversion was demonstrated for the preparation of silane: SiCl 4 + LiAlH 4 → SiH 4 ...

  4. Dimethyldichlorosilane - Wikipedia

    en.wikipedia.org/wiki/Dimethyldichlorosilane

    The mechanism of the direct synthesis is not known. However, the copper catalyst is essential for the reaction to proceed. In addition to dimethyldichlorosilane, products of this reaction include CH 3 SiCl 3, CH 3 SiHCl 2, and (CH 3) 3 SiCl, which are separated from each other by fractional distillation. The yields and boiling points of these ...

  5. RTV silicone - Wikipedia

    en.wikipedia.org/wiki/RTV_silicone

    The silicone polymers are often made by reacting dimethyl dichlorosilane with water. [4] Linear dimethylpolysiloxane polymer reaction. Fillers such as acetic acid can provide a fast cure time, while oxides and nitrides can provide better thermal conductivity. Tack-free times are typically on the order of minutes, with cure times on the order of ...

  6. Polysilicon hydride - Wikipedia

    en.wikipedia.org/wiki/Polysilicon_hydride

    This reaction was reported in 1921 by the German chemists Lothar Woehler (1870–1952) and Friedrich Mueller. In 1923, German chemists Alfred Stock (1876–1946) and Friedrich Zeidler (1855–1931) found the (SiH) x polymer is formed along with silane gas by the action of sodium amalgam on dichlorosilane (SiH 2 Cl 2 ).

  7. Epitaxy - Wikipedia

    en.wikipedia.org/wiki/Epitaxy

    (Hydrogen chloride may be intentionally added to etch the wafer.) [citation needed] An additional etching reaction competes with the deposition reaction: SiCl 4(g) + Si (s) ↔ 2SiCl 2(g) Silicon VPE may also use silane, dichlorosilane, and trichlorosilane source gases. For instance, the silane reaction occurs at 650 °C in this way: SiH 4 → ...

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  9. Hydrosilanes - Wikipedia

    en.wikipedia.org/wiki/Hydrosilanes

    Setting aside silane itself, for which is used mainly in the microelectronics industry as a source of Si, hydrosilanes participate in many reactions. Hydrosilanes are mainly used for diverse styles of reduction in both industrial and laboratory-scale reactions. These including deoxygenation, hydrosilylation, and ionic hydrogenation.