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Substance Formula 0 °C 10 °C 20 °C 30 °C 40 °C 50 °C 60 °C 70 °C 80 °C 90 °C 100 °C Barium acetate: Ba(C 2 H 3 O 2) 2: 58.8: 62: 72: 75: 78.5: 77: 75
Hafnium silicate (HfSiO 4) is a silicate of hafnium, and it is a tetragonal crystal. [23] Thin films of hafnium silicate and zirconium silicate grown by atomic layer deposition , chemical vapor deposition or MOCVD , can be used as a high-k dielectric as a replacement for silicon dioxide in modern semiconductor devices. [ 24 ]