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  2. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    The PVD process can be carried out at lower deposition temperatures and without corrosive products, but deposition rates are typically lower. Electron-beam physical vapor deposition, however, yields a high deposition rate from 0.1 to 100 μm/min at relatively low substrate temperatures, with very high material utilization efficiency. The ...

  3. Electromagnetically enhanced Physical Vapor Deposition

    en.wikipedia.org/wiki/Electromagnetically...

    Thin-film deposition is the overarching technology from which PVD, CVD, ALD, EBPVD, and EPVD are derived, each employing different methods to achieve specific coating characteristics. PVD (Physical Vapor Deposition) involves the physical vaporization of material in a vacuum to form a thin film, while EBPVD (Electron Beam Physical Vapor ...

  4. Electron-beam technology - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_technology

    Electron-beam machining is a process in which high-velocity electrons are concentrated into a narrow beam with a very high planar power density. The beam cross-section is then focused and directed toward the work piece, creating heat and vaporizing the material. Electron-beam machining can be used to accurately cut or bore a wide variety of metals.

  5. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  6. High-power impulse magnetron sputtering - Wikipedia

    en.wikipedia.org/wiki/High-power_impulse...

    The main ionisation mechanism is electron impact, which is balanced by charge exchange, diffusion, and plasma ejection in flares. The ionisation rates depend on the plasma density. The ionisation degree of the metal vapour is a strong function of the peak current density of the discharge.

  7. Topological insulator - Wikipedia

    en.wikipedia.org/wiki/Topological_insulator

    Topological insulators can be grown using different methods such as metal-organic chemical vapor deposition (MOCVD), [67] physical vapor deposition (PVD), [68] solvothermal synthesis, [69] sonochemical technique [70] and molecular beam epitaxy. Schematic of the components of a MBE system (MBE). [34] MBE has so far been the most common ...

  8. Category:Physical vapor deposition techniques - Wikipedia

    en.wikipedia.org/wiki/Category:Physical_vapor...

    Pages in category "Physical vapor deposition techniques" The following 10 pages are in this category, out of 10 total. This list may not reflect recent changes .

  9. Category:Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Category:Physical_vapor...

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