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Photographic emulsion is a light-sensitive colloid used in film-based photography. Most commonly, in silver-gelatin photography , it consists of silver halide crystals dispersed in gelatin . The emulsion is usually coated onto a substrate of glass , films (of cellulose nitrate , cellulose acetate or polyester ), paper, or fabric.
Instead, scientists would refer to photosensitizers as sensitizers used in photo-oxidation or photo-oxygenation processes. Studies during this time period involving photosensitizers utilized organic photosensitizers, consisting of aromatic hydrocarbon molecules, which could facilitate synthetic chemistry reactions.
The root words photo, litho, and graphy all have Greek origins, with the meanings 'light', 'stone' and 'writing' respectively. As suggested by the name compounded from them, photolithography is a printing method (originally based on the use of limestone printing plates) in which light plays an essential role.
free radical initiated photo cross-linking of polymers; Issues: potential oxygen inhibition; swelling during development long narrow lines can become wavy; swelling is an issue for high-resolution patterning; Example: SU-8 (epoxy-based polymer), good adhesion), Kodak Photoresist (KPR) Modulation transfer function
A panchromatic emulsion is a type of photographic emulsion that is sensitive to all wavelengths of visible light, and produces a monochrome photograph—typically black and white. Most modern commercially available film is panchromatic, and the technology is usually contrasted with earlier methods that cannot register all wavelengths ...
A developable photographic latent image forms when crystals of silver halide in an emulsion layer are exposed to light. The initial nucleation phase is chemically and thermodynamically unstable; it is thus temperature sensitive, and involves the production of one, or very few silver atoms as sub-latent image specks in each silver halide crystal.
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The mask allows for precise control over the doping and etching processes used to form devices on silicon wafers. It is important for the mask to hold up to chemical attack during the etching process. Photoresists have three major components, a solvent, resin, and sensitizer (or photoactive compound).
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