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It is called "soft" because it uses elastomeric materials, most notably PDMS. Soft lithography is generally used to construct features measured on the micrometer to nanometer scale. According to Rogers and Nuzzo (2005), development of soft lithography expanded rapidly from 1995 to 2005. Soft lithography tools are now commercially available.
The solid solubility of the catalyzing agent is low in the solid and liquid phases of the substrate material. The equilibrium vapor pressure of the catalyst over the liquid alloy must be small so that the droplet does not vaporize, shrink in volume (and therefore radius), and decrease the radius of the growing wire until, ultimately, growth is ...
A typical substrate might be rigid such as metal, concrete, or glass, onto which a coating might be deposited. Flexible substrates are also used. [1] Some substrates are anisotropic with surface properties being different depending on the direction: examples include wood and paper products.
Rogers offers liquid cooling materials designed to dissipate large amounts of heat, and provide thermal management of high-power laser diodes and other heat-generating optical devices. The cooling structures are copper foil channels bonded into a tight block, with aluminum-nitride (AlN) isolation layers added for extra performance.
Reflection high-energy electron diffraction (RHEED) is a technique used to characterize the surface of crystalline materials. RHEED systems gather information only from the surface layer of the sample, which distinguishes RHEED from other materials characterization methods that also rely on diffraction of high-energy electrons.
A fluidized bed reactor (FBR) is a type of reactor device that can be used to carry out a variety of multiphase chemical reactions. In this type of reactor, a fluid (gas or liquid) is passed through a solid granular material (usually a catalyst) at high enough speeds to suspend the solid and cause it to behave as though it were a fluid.
To compute bands of the crystal (i.e. k-k 0 diagrams), successive values of frequency (k) are tried - in conjunction with pre-selected values of propagation constant (k 0) and propagation direction (θ 0 & φ 0) - until a combination is found which drives the determinant of the matrix to zero.
Simplified illustration of the process of fabrication of a CMOS inverter on p-type substrate in semiconductor microfabrication. Each etch step is detailed in the following image. The diagrams are not to scale, as in real devices, the gate, source, and drain contacts are not normally located in the same plane. Detail of an etch step.