Search results
Results from the WOW.Com Content Network
Example of Carmack's stencil shadowing in Doom 3. Shadow volume is a technique used in 3D computer graphics to add shadows to a rendered scene. It was first proposed by Frank Crow in 1977 [1] as the geometry describing the 3D shape of the region occluded from a light source.
Drawing the scene with shadows can be done in several different ways. If programmable shaders are available, the depth map test may be performed by a fragment shader which simply draws the object in shadow or lighted depending on the result, drawing the scene in a single pass (after an initial earlier pass to generate the shadow map).
Stencil lithography is a novel method of fabricating nanometer scale patterns using nanostencils, stencils (shadow mask) with nanometer size apertures. It is a resist-less, simple, parallel nanolithography process, and it does not involve any heat or chemical treatment of the substrates (unlike resist -based techniques).
The simple combination of depth test and stencil modifiers make a vast number of effects possible (such as stencil shadow volumes, Two-Sided Stencil, [1] compositing, decaling, dissolves, fades, swipes, silhouettes, outline drawing, or highlighting of intersections between complex primitives) though they often require several rendering passes ...
A regular grid sample pattern, where multisample locations form an evenly spaced grid throughout the pixel, is easy to implement and simplifies attribute evaluation (i.e. setting subpixel masks, sampling color and depth). This method is computationally expensive due to the large number of samples.
A modified uniformly redundant array (MURA) is a type of mask used in coded aperture imaging. They were first proposed by Gottesman and Fenimore in 1989. They were first proposed by Gottesman and Fenimore in 1989.
Stencils are also used in micro- and nanotechnology, as miniature shadow masks through which material can be deposited, etched or ions implanted onto a substrate. These stencils are usually made out of thin (100-500 nm) low-stress Silicon nitride (SiN) in which apertures are defined by various lithographic techniques (e. g. electron beam ...
The fifteen standard light source, surface, volume, displacement, and imager shaders required by the specification. Any additional shaders, and any deviations from the standard shaders presented in this specification, must be documented by providing the equivalent shader expressed in the RenderMan shading language.