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A plume ejected from a SrRuO 3 target during pulsed laser deposition. One possible configuration of a PLD deposition chamber. Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.
Evaporative deposition: the material to be deposited is heated to a high vapor pressure by electrical resistance heating in "high" vacuum. [4] [5] Close-space sublimation, the material, and substrate are placed close to one another and radiatively heated. Pulsed laser deposition: a high-power laser ablates material from the target into a vapor.
Pulsed operation of lasers refers to any laser not classified as continuous wave, so that the optical power appears in pulses of some duration at some repetition rate. [1] This encompasses a wide range of technologies addressing a number of different motivations. Some lasers are pulsed simply because they cannot be run in continuous mode.
Thermal laser epitaxy (TLE) is a physical vapor deposition technique that utilizes irradiation from continuous-wave lasers to heat sources locally for growing films on a substrate. [ 1 ] [ 2 ] This technique can be performed under ultra-high vacuum pressure or in the presence of a background atmosphere, such as ozone , to deposit oxide films.
He pioneered the synthesis of high-purity BNNTs by pulsed-laser deposition (PLD) [15] and chemical vapor deposition (CVD). [ 16 ] [ 17 ] His group at MTU demonstrated the growth of BNNTs at 600 o C by using an all-solid-state UV laser, and also invented a low-temperature CVD method that enables the growth of BNNTs at 1100-1200 o C, similar to ...
A variation of this type of application is to use laser ablation to create coatings by ablating the coating material from a source and letting it deposit on the surface to be coated; this is a special type of physical vapor deposition called pulsed laser deposition (PLD), [8] and can create coatings from materials that cannot readily be ...
Thin film growth and preparation techniques with stringent requirements for purity, such as molecular beam epitaxy (MBE), UHV chemical vapor deposition (CVD), atomic layer deposition (ALD) and UHV pulsed laser deposition (PLD) Angle resolved photoemission spectroscopy (ARPES) Field emission microscopy and Field ion microscopy; Atom Probe ...
In physics and physical chemistry, time-resolved spectroscopy is the study of dynamic processes in materials or chemical compounds by means of spectroscopic techniques.Most often, processes are studied after the illumination of a material occurs, but in principle, the technique can be applied to any process that leads to a change in properties of a material.